Vistec Electron Beam
GmbH is pleased to announce that it has stepped into a joined electron-beam
lithography project with the renowned Moscow Institute of Electronic Technology
(MIET). MIET, one of the most advanced Universities and research institutions
in Russia and Vistec Electron Beam, a leading German supplier of electron-beam
lithography systems will collaborate within a dedicated photomask manufacturing
project recently kicked-off in Russia.
“After ramping up, the MIET Photomask Centre will provide both semiconductor
industry as well as research institutes in Russia with advanced photomasks for
a wide range of applications”, said Vladimir Bespalov, Senior Vice Rector
of MIET Technical University. “Besides mask manufacturing, education and
research will play a central role in the new Photomask Centre. MIET selected
a Variable Shaped Beam system from Vistec because of the lithography performance,
high flexibility, field proven reliability and ease of operation functionality
of the system.”
The 50kV Variable Shaped Beam system from Vistec is equipped with a fully automated
substrate handling and is prepared to expose different substrate types and sizes.
“We are extremely proud to team-up with MIET in this photomask manufacturing
project”, stated Wolfgang Dorl, General Manager of Vistec Electron Beam
GmbH. “The recently shipped Variable Shaped Beam system represents a continuation
of an outstanding business history the company has with Russia and opens up
new and exciting opportunities in the growing Russian market.”