Favorable Conclusion Provided to DA NanoMaterials in Patent Infringement Litigation

A jury in the patent infringement litigation in the United States District Court for the District of Arizona rendered a verdict last week that alumina-based and silica-based tungsten Chemical Mechanical Planarization (CMP) slurries produced and sold by DuPont Air Products NanoMaterials, LLC (DA NanoMaterials) do not infringe Cabot Microelectronics' patents.

"We are extremely pleased with the jury's conclusion that DA NanoMaterials' tungsten CMP slurries do not infringe Cabot's patents," said Seng Wui Lim, chief executive officer, DA NanoMaterials.  "The ruling reinforces the fact that our products are vastly different from Cabot's and enables us to continue to aggressively pursue future business growth regarding these products.  We remain committed to delivering innovative products, and will continue to compete in the marketplace worldwide while providing our customers with superior technology and service."

In addition to this court ruling, on June 18, the appellate Korean Patent Court found Cabot's tungsten CMP Korean patent invalid.  This continues a series of losses by Cabot in Korean court cases finding Cabot's tungsten CMP patent invalid, including invalidations in the Seoul District Court, the appellate Korean High Court and the Korean Intellectual Property Tribunal.

Source: http://www.airproducts.com/