Instruments Plasma Technology, leader in etch, deposition and growth systems,
has recently received an order for three plasma etch and deposition tools from
the Centre of Excellence in Nanoelectronics (CEN) at the Indian Institute of
Science (IISc) in Bangalore, India. The three System100 tools will be situated
in the CEN’s state-of-the art nanofabrication facility’s new clean
room and consist of two PlasmaPro™ System100 ICP Cobra etch tools and
one PlasmaPro System100 PECVD tool.
A flexible and powerful solution for plasma etching and deposition processes,
the System100’s load-locked wafer entry allows fast wafer exchange, the
widest range of process gases and an extended process temperature range. Allowing
maximum process flexibility for compound semiconductor, optoelectronics, photonics,
MEMS and microfluidics applications, the PlasmaPro System100 plasma etcher and
deposition tool can have many configurations, including the ICP and PECVD options
ordered by IISc.
The two ICP-RIE systems and the PECVD systems have been configured for the
widest range of processes required at CEN, IISc, which is a multi-user national
facility. The etch chemistries include the capability to etch poly-silicon,
silicon oxide, silicon nitride and a variety of metals. In addition to the silicon
processing, the tools are also configured for GaAs and GaN process capability
for high speed, high frequency power transistors. The PECVD system enables stress
engineered nitride for MEMS sensors, low temperature oxide and very thick poly-silicon
membrane as a structural material for inertial sensors.
Comments Prof.Navakanta Bhat from the Department of Electrical Communication
Engineering at IISc, “We chose to order Oxford Instruments’ systems
for their superior process uniformity, and the high level of support offered
by the company. We were particularly impressed by the technical capabilities
of the staff and their willingness to work with their customers, considering
the customer as a partner.
Our new facility will be one of its kind in the country with a 14,000 sq.ft
clean room in a new building (90,000 sq.ft) for the Centre for Nano Science
and Engineering (CeNSE). The state of the art clean room will house the best
tools, catering to the diverse needs of researchers, and the Oxford Instruments’
systems offer the breadth of processes and leading edge technology we need.
Oxford Instruments’ systems will enable IISc to carry out frontier research
in a number of areas, including Nanoscale electronics and MEMS and help achieve
our aim of creating technologies that can be commercially exploited by industry.”
Mark Vosloo, Sales & Customer Support Director for Oxford Instruments Plasma
Technology is delighted with this order, “This second order in a year
from an important Indian Research Institute results from our ability to meet
our customers’ needs through advanced technology and service, while having
the experience for them to be able to rely on our innovative world class products.”