4Wave, a provider of thin film equipment and thin film coatings, has successfully completed the fiscal year 2011 with the delivery of multiple 200 mm ion beam sputtering systems to semiconductor foundries for the production of micro electro mechanical systems (MEMS).
The 200 mm ion beam sputtering system is capable of depositing dielectric material atomically for MEMS tools, thus enabling the user to choose the optical features of the film deposited. It can process 200 mm wafers continuously round-the-clock.
4Wave continues to spend for research and development activities in order to assist its customers for their future generation of products. This allows the company to show the capabilities of equipment to prospective customers and supply systems equipped with production ready processes. Through this business model, the company’s customers can now quickly test the system for their production requirements and reduce the product development phase.
4Wave provides thin film processing systems for several applications and industries, including renewable energy and defense. The company also offers its thin film processing systems and metrology for contracted research and coating services, thus enabling its customers to design their products devoid of high investment needed to buy such systems. It can participate in US projects associated with the defense field, thanks to its compliance with International Trade and Arms Regulation.
According to 4Wave’s Vice President of Technology, Sami Antrazi, the company’s ion beam sputtering technology for processing MEMS will be a critical system at semiconductor foundry fabs for the near future.
Source: http://www.4waveinc.com