Following the great success of their Seminar hosted with the IOS-CAS in Beijing last year attended by over 100 participants, Oxford Instruments will hold a one day Seminar on 19th March in Shanghai, focussing on Nanoscale Plasma Processing.
This one day event, being held the day before Semicon China 2012, will feature talks by a number of invited guest speakers, specialists from China, Taiwan and Europe, in addition to Process and Applications experts from Oxford Instruments Plasma Technology.
These academic and industrial experts will discuss topics including Atomic Layer Deposition (ALD), Photovoltaics (PV), Deep Silicon Etch and Ion Beam technologies during the full one day programme.
In addition to Oxford Instruments speakers, talks from guest speakers include:
- Introduction to ALD and its applications, including photovoltaics; Prof Erwin Kessels, University of Eindhoven (TU/e), Netherlands
- Etch & deposition process in the OPTO and MEMS application device; Dr. Chu Ann-Kuo, Professor of Department of Photonics, National Sun Yat-sen University, Taiwan
- Infrared Focal Plane Arrays (IRFPAs) detector for space applications; Dr. Zhenghua YE, SITP (Shanghai Institute of Technology Physics)
- Micro/Nano fabrication and characterization of Si field electron emitters; Guest Speaker: Dr. Juncong SHE, Sun Yat-Sen University, China
- ALD used in the MEMS application; Jerry Wang, Manager of Microsystems Technology Center, ITRI, Taiwan
Jeffrey Seah, Asia Business Manager, Oxford Instruments Plasma Technology, who will open the Seminar comments: "We are anticipating a large audience at this Seminar in Shanghai, and are extremely honoured that so many distinguished guest speakers have accepted our invitation to speak about their work in Plasma Processing. Our Seminars are a great opportunity for the Plasma Processing community to come together, to share their experiences, and to learn more from leading international experts in their field."
Based on the success of the 2011 Seminar in Beijing, Oxford Instruments anticipates a very high level of interest from both academic and production participants, attracted by such an interesting programme and prestigious speakers.
The event is free to attend, but booking is essential via firstname.lastname@example.org or email@example.com