By Will Soutter
Entegris has launched a new 10 nm liquid filter labeled the Intercept HPM Liquid Filter which is the latest innovation in its line of sophisticated filter solutions and find applications in exacting semiconductor manufacturing processes.
Entegris is set to unveil the product at the SEMICON Taiwan tradeshow scheduled to be hosted between September 5 and 7 at Taipei World Trade Center at Taipei in Taiwan. The company will be showcasing its products at booth number 174.
The new launch in the Intercept HPM class of filters is designed to eliminate contaminants and other particles from dilute solutions and liquid chemistries that are employed in advanced semiconductor fabrication facilities for the wet etching and cleaning processes. An asymmetric ultra-high molecular weight polyethylene (UPE) with a modified surface is incorporated as a membrane in the HPM liquid filter. The membrane offers the greatest degree of particle retention and facilitates clean flow owing to its hydrophilic characteristics. There is a need for improved filtration techniques in order to meet the quality levels dictated by the rapid advances the semiconductor industry is making towards chip design process employing below 20 nm processes.
According to Todd Edlund, Vice President and General Manager of the Contamination Solutions Division at Entegris, the 10 nm Intercept HPM filter augments their liquid filter offering and serves as a complement to the high-flow Torrento line of filters employed in harsh chemical environments.
Entegris possesses ISO 9001 certification. The company operates manufacturing facilities, research centers and customer service centers in the US, France, Japan, China, Israel, Germany, Singapore, Malaysia, Taiwan and South Korea.