Posted in | Microscopy | Nanoanalysis

XEI Scientific Receive Patent for their Oxidative Cleaning Method for SEM and High-Vacuum Equipment

Published on November 22, 2013 at 10:02 AM

XEI Scientific is pleased to announce that the company has been granted a new US patent # US8507879B2 which describes a new oxidative cleaning method and system for electron microscopes and other high vacuum instrumentation using UV excitation in an oxygen radical source.

This patent research provides an optional path that supplements our work to improve XEI's Evactron® RF plasma cleaning systems.

The Evactron RF plasma creates radicals that chemically etch and remove hydrocarbons, organics, and surface carbon from SEMs and other vacuum systems, by reacting with all exposed surfaces or specimens. The contaminants are ashed into volatile products which can be pumped out of the chamber.

XEI has sold more than 1800 Evactron systems worldwide solving contamination problems in many different environments using instrumentation such as electron microscopes, FIBs and other vacuum sample chambers.

About XEI Scientific, Inc.

XEI Scientific Inc. invented the Evactron De-Contaminator in 1999 as the first plasma cleaner to use a downstream cleaning process to remove carbon from electron microscopes. A proprietary plasma source uses air to produce oxygen radicals for oxidation of carbon compounds for removal by the pumps.

Carbon-free-vacuum produces the highest quality images and analytical results from SEMs and other vacuum analytical instruments. XEI innovations include a unique RF plasma generator, a patented RF electrode, and easy start programmed plasma cleaning. All XEI products come with a 5 year warranty and are compliant with CE, NRTL, and Semi-S2 safety standards. XEI offers a variety of Evactron® decontamination systems to meet user needs and >1800 installations around the world.

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