Site Sponsors
  • Strem Chemicals - Nanomaterials for R&D
  • Park Systems - Manufacturer of a complete range of AFM solutions
  • Oxford Instruments Nanoanalysis - X-Max Large Area Analytical EDS SDD

High Accuracy Measurement of Film Thickness, Refractive Index and Reflectivity of Thin Films and Multilayer Stacks From Horiba Jobin Yvon

Published on August 22, 2007 at 10:43 PM

Horiba Jobin Yvon has extended the performance capability of the UVISEL spectroscopic phase modulated ellipsometer with the integration of the VIP DUV Spectroscopic reflectometer. The combination of high precision ellipsometer and reflectometer measuring at the same sample position allows characterisation of features as small as 10 microns.

UVISEL spectroscopic phase modulated ellipsometer integrated with the VIP DUV Spectroscopic reflectometer

Applications of the UVISEL VIP include measurement of film thickness, refractive index and reflectivity of thin films and multilayer stacks with very high accuracy.

By the addition of a large area mapping stages of dimension 200mm, 300mm and above, and with integrated pattern recognition software the UVISEL VIP is able to characterise patterned materials found in semiconductor wafers, display materials, OLED structures and biosensors with thicknesses ranging from a few angstroms to several tens of microns.

The well proven DeltaPsi2 software package controls the complete instrument, and provides a simple interface for production, pilot plant and research applications.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Submit