EVG®720 Automated UV Nanoimprint Lithography System

EVG® 720 UV nanoimprint system is designed with an innovative SmartNIL technology which when combined with EVG's material expertise results in the mass production of micro and nanoscale structures.

The system has an unmatched throughput in printing small nanostructures of size down to 40nm over a large area and at a low cost. The integrated electrostatic discharge function minimizes contamination of nanoparticles. All the materials can be imprinted in an open material platform.

Key Features

The main features of the EVG® 720 UV nanoimprint system include:

  • Integrated stamp manufacturing function
  • Integrated electrostatic discharge
  • High throughput of over 40wph
  • Easy to maintain
  • No additional plumbing and tubing required
  • Large area imprint, up to 150mm2
  • Top and/or bottom side alignment
  • Optical clearance function avoids the formation of visible vacuum lines in the active imprint area
  • Integrated separation of stamp and substrate
  • Low cost of ownership


The major applications of the EVG® 720 UV nanoimprint system include:

  • Microfluidics
  • LEDs
  • Photonics
  • Volume production of optics
  • BioMEMS devices
  • Advanced data storage

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