Rolith, Inc., the leader in developing advanced nanostructured coatings and devices, today announces the successful installation of a 2nd-generation nanostructuring prototype tool built by SUSS MicroTec AG under exclusive license from Rolith, Inc. – the RML-2 tool.
This prototype is based on a disruptive nanolithography method (Rolling Mask Lithography – RMLTM) developed by Rolith, Inc. It enables users to create nanostructures over large areas – up to 1m x 0.3 m - of substrate materials in a high throughput and cost effective manner.
Availability of high throughput and low cost nanopatterning technique enables improved performance and novel products for the renewable energy, electronics, and green building markets. High efficiency solar panels, high brightness LEDs, glare-free cell phone and TV screens, and Low-E glass windows are just a few examples of advanced products which could be enabled by RML technology. Rolith’s internationally patented method is based on a proprietary implementation of near-field optical lithography using cylindrically shaped rolling masks. The masks are manufactured by Rolith and can be customized to fit specific customer’s application requirements. Sub-wavelength resolution is achieved by phase-shift interference effect or plasmonic enhancement printing structures. Continuous rolling mask lithography has the potential to offer high throughput at low cost.
The RML-2 tool enhances capabilities initially demonstrated by the 1st generation tool, RML-1, built in 2011. RML-2 can process 1m long glass plates, multiple smaller glass plates, or semiconductor wafers using a conveyor-like substrate handler. In addition, RML process is quite tolerant to substrate non-flatness, which is beneficial for processing architectural glass windows or sapphire LED wafers.
To date the RML-2 tool was successfully installed and qualified at Rolith facilities in Pleasanton, California and at Asahi Glass Company’s R&D facility in Tokyo, Japan. Rolith continues to seek out additional joint development partners to commercialize various applications of its nanostructuring technology.
“We are very happy with the progress of development of our new lithography concept. Now, with the 2nd generation of Rolith’s lithography tools in the field, we can effectively address a rapidly growing interest in this technology from multiple industries,” said Dr. Boris Kobrin, founder and CEO, Rolith.
“The innovative optical nanolithography technology by Rolith together with our equipment solution allows printing of very small structures. With continuous rolling mask lithography, processing large substrate sizes is possible offering a completely new capability to our customers,” said Mr. Frank Averdung, President and CEO SÜSS MicroTec AG.
“This progress could enable us to create nanostructures over large areas and to apply in variety of markets.” said Mr. Hiroshi Usui, General Manager of AGC America, Inc.