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Ultraviolet nanoimprint lithography (UV-NIL) is a manufacturing technique for producing nanostructures using UV-curable resin. One of its main advantages is its sheer simplicity;
Henniker Plasma announces new Spanish distribution partners, Irida Ibérica.
This week, at the SPIE Advanced Lithography conference 2019, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, demonstrates the positive impact of sequential infiltration synthesis (SIS) on the EUVL (extreme ultra-violet lithography) patterning process.
Ever since graphene was discovered, researchers have tried to exploit the material to create nano-sized electronics.
An innovation in fabricating atom-thin processors has been reported by an international team of scientists. This discovery could have extensive influence on nanoscale chip manufacture and in labs worldwide where researchers are studying 2D materials for ever-smaller and -faster semiconductors.
With a determination to find new ways to extend electronics beyond the use of silicon, physicists are testing other properties of electrons, beyond charge.
One of the major inconveniences of modern display screens experienced while using a computer underneath overhead lighting or adjacent to a window, watching television in complete darkness, or taking a photo outdoors on a sunny day using a smartphone is the phenomenon called glare.
By definition, dialysis is a process in which molecules are filtered out of a solution by getting diffused through a membrane into a comparatively dilute solution. Apart from hemodialysis in which waste is eliminated from blood, researchers employ dialysis for removing residue from chemical solutions, purifying drugs, and for isolating molecules for medical diagnosis, generally by making the materials to go through a porous membrane.
From the 1950s, considerable research and development initiatives have aimed to design a superconducting computer with the ability to perform high-speed computations without heat dissipation.