Dubai Electricity and Water Authority (DEWA) announced that DEWA-SAT 1, which it launched last month, is stable in its low earth orbit at 525 kilometres. It travels at some 7.5 kilometres per second and takes about 90 minutes to orbit the Earth.
The development of structurally and thermally sound marking stamps based on phase-separated nanostructures (PSNs) for nanoimprint lithography (NIL) systems was recently reported.
We proudly present the new EPBG Plus, the latest generation of the highly successful EBPG series and now faster, more precise, and more stable than ever before.
Ultraviolet nanoimprint lithography (UV-NIL) is a manufacturing technique for producing nanostructures using UV-curable resin. One of its main advantages is its sheer simplicity;
Henniker Plasma announces new Spanish distribution partners, Irida Ibérica.
This week, at the SPIE Advanced Lithography conference 2019, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, demonstrates the positive impact of sequential infiltration synthesis (SIS) on the EUVL (extreme ultra-violet lithography) patterning process.
Ever since graphene was discovered, researchers have tried to exploit the material to create nano-sized electronics.
An innovation in fabricating atom-thin processors has been reported by an international team of scientists. This discovery could have extensive influence on nanoscale chip manufacture and in labs worldwide where researchers are studying 2D materials for ever-smaller and -faster semiconductors.
With a determination to find new ways to extend electronics beyond the use of silicon, physicists are testing other properties of electrons, beyond charge.
One of the major inconveniences of modern display screens experienced while using a computer underneath overhead lighting or adjacent to a window, watching television in complete darkness, or taking a photo outdoors on a sunny day using a smartphone is the phenomenon called glare.