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Park Systems Corporation is the world’s leading manufacturer of atomic force microscopy systems for scientific research, nanoscale engineering, semiconductor fabrication and quality assurance. Park Systems provides a full range of AFM and related products to those in the chemistry, materials, physics, life sciences, and semiconductor industries. Its customers include most of the world's largest semiconductor companies and renowned scientific research universities and national labs. Park Systems was established in 1997 with the mission to equip scientists and engineers with the most advanced AFM systems that enable them to see, measure and characterize things at the highest nanoscale resolution and accuracy. Since the time of its foundation, Park Systems has delivered on its promise with numerous innovations, including True Non-Contact Imaging, 3D metrology, and fully automated AFM systems for both research and industrial applications.
Park Systems recently launched the Park FX series that is a new leap forward in atomic force microscopy. The Park FX series AFM is an automatic AFM that hides all the complexities of an AFM system. It permits users to simply focus on their research instead of its tool operation.
Investigating Intrinsic Electrical Properties of 2D Transition Metal Dichalcogenides
High Vacuum C-AFM Imaging
Utilizing Back-Gate Voltage Biases for 2D Materials
The Investigation and Optimization Piezo Actuators and Photodiodes
Utilizing AFM for Photomask Repair in Photolithography
Exploring Electrical Characterization Through Scanning Microwave Impedance Microscopy
Park FX40: The Story Behind Designing a New Class of the Automatic Atomic Force Microscope (AFM)
Automatic Atomic Force Microscopy (AFM) with the FX40
Superlattice Electromechanical Characterization with Piezo-Response Force Microscopy
Utilizing Sideband Kelvin Probe Force Microscopy for Surface Potential Imaging
Utilizing Park System's SECCM for Nanoscale Electrochemical Studies
Polymer Thin Films: High Resolution Phase Imaging
Dual Frequency Resonance Tracking: Stabilizing the Piezoresponse
Using Scanning Spreading Resistance Microscopy (SSRM) and Scanning Capacitance Microscopy (SCM) for Carrier Profiling in Vacuum
Nanolithography by Contact AFM Based on Anodic Oxidation
Atomic Force Microscopy (AFM) Nanolithography: Nanoscale Material Patterning
Advanced Materials in a High Vacuum Environment: Improved Electrical Characterization
Atomic Force Microscopy (AFM): A Comparison of AM KPFM and Sideband KPFM
Using AFM Lithography for Nanopatterning
Using SSRM to Characterize a Li Ion Battery Electrode
SSRM and SCM for Carrier Profiling in a High Vacuum
C-AFM for Current Distribution Mapping of Carbon Nanotube-Embedded Polymer
The Benefits of a High Vacuum for Electrical Scanning Probe Microscopy
Using FM-KPFM to Enhance Surface Detection
Defecting Surface Recognition on Coating Layers
Measuring Fixed Cells with AFM and Scanning Ion Conductance Microscopy
An Introduction to Non-Contact Mode AFM Under Ambient Atmosphere
Characterization of Vacuum Channel Nanoelectronic Devices
In Situ Monitoring of Copper Electrodeposition Using ECAFM
Using True Non-Contact Mode AFM for the Imaging of Plasmids in Liquids
Using LFM to Determine the Composition of Materials
How Nanobubbles Effect Engineering Processes and AFM Measurements
Simultaneous Electrochemical and Topographical Mapping
Using of PFM for Failure Analysis of a Multilayered Ceramic Capacitor
Observing Local Electromechanical Responses at Nanometer Levels
Analyzing Semiconductor Device Surfaces and Electrical Properties
Quantification of Elastic Modulus in Materials Using AFM
The Role of Atomic Force Microscopy (AFM) in 3D Printing
An Introduction to Atomic Force Microscopy (AFM) with Ultra-High Resolution
Three-Dimensional Atomic Force Microscopy
Automatic Defect Review AFM for Hard Disk Media Failure Analysis
Automated AFM Throughput in Automatic Defect Review
Investigation of Polyester Yarn Interaction with Silicone Matrix
Sub-Angstrom Roughness Measurement Accuracy and Repeatability
Revolutionizing AFM with Point-And-Click Imaging Technology
Post-Etching Silicon Crystal Defects on a 300 mm Wafer
Electrolyte Solution Topography Imaging of Various Organic Samples
Measuring Electrical Characteristics of Semiconductor Devices
Cellulose Nanowhiskers Topography and Young’s Modulus Imaging
Fully Automated Atomic Force Microscopy (AFM) Measurement and Analysis
High Throughput-High Resolution Sidewall Imaging Using 3D AFM
Using Ion Conductance Microscope (ICM) to Image Collagen Fibrils
Using Ion Conductance Microscopy (ICM) to Measure Cell Volume
True Topography AFM Scanning Using A Low Noise Z-Position Sensor
Characterization of Zinc Oxide Nanorod Samples
Park SmartScan AFM Operating Software
Non-Contact Mode AFM and Dimensional Nanometrology for Inline Manufacturing
NanoScientific Symposium 2022 Now Open for Registration
Powerful New Semiconductor Tool Introduced by Park Systems Combines Atomic Force Microscopy with White Light Interferometry
NX20 AFM for Failure Analysis from Park Systems - MRS 2012
The NX10 AFM from Park Systems - The World's Most Accurate Atomic Force Microscope
XE-100 Series AFMs from Park Systems
SmartAnalysis™: AFM Image Analytics
Park SmartLitho™: Operating Software for Nanolithography
Park NX-IR: Nanoscale Infrared Spectroscopy AFM
Park NX-Hybrid WLI AFM System
Park FX40: Automatic AFM
Accurion i4 Active Vibration Isolation
Park NX-Hivac: High Vacuum AFM System
Accurion EP4: Imaging Ellipsometer
Park NX20 Lite AFM System
Park NX-TSH: Fully automated Atomic Force Microscopy (AFM)
Park NX-Mask: AFM-Based Photomask Repair
Park NX7: AFM with Flexible Sample Handling
Atomic Force Microscope for the Nanoscale - NX12
Park Wafer Series Atomic Force Profiler
Park HDM Series AFM for Media and Substrate Manufacturing
Park NX20 300 mm AFM for Wafer Measurement and Analysis
Park NX10 – High Accuracy, Non-Contact Research AFM
Park NX20 – AFM for Large Samples and Failure Analysis
Park Systems NX-3DM Automated AFM System