Park Systems

Park Systems

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KANC 15F
Gwanggyo-ro 109
Suwon, 16229
South Korea
Phone: +82 31 546-6800
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Park Systems developed the world’s first commercial AFM in 1989, opening up a new world of research and development.

Park Systems provides original and innovative AFM solutions for the most accurate nanoscale measurement. In nanoscale metrology, having data that is repeatable, reproducible, and reliable is just as crucial as resolution. The innovative crosstalk-elimination (XE) metrology platform ushered in a new era of nanometrology that overcomes non-linearity and non-orthogonality associated with conventional piezotube based systems. Park Systems' innovative AFM technology is a disruptive market force and it expands the application of nanometrology beyond the limits of conventional AFM technology.

Park Systems promotes sustainable, long-term growth of its AFM business by constantly seeking to address the changing needs of AFM users. Our comprehensive portfolio of products, software, services, and expertise is designed and engineered to help customers achieve the nanometrology performance that meets the needs and requirements of present and future applications. Since improvements in nanometrology today are key to enabling tomorrow's research, analysis, processing and product manufacturing, our innovative technology and market leadership in the field of nanometrology secure our future at the forefront of the AFM industry.

Park FX40: The Story Behind Designing a New Class of the Automatic Atomic Force Microscope (AFM)

Park FX40: The Story Behind Designing a New Class of the Automatic Atomic Force Microscope (AFM)
Automatic Atomic Force Microscopy (AFM) with the FX40

Automatic Atomic Force Microscopy (AFM) with the FX40
Superlattice Electromechanical Characterization with Piezo-Response Force Microscopy

Superlattice Electromechanical Characterization with Piezo-Response Force Microscopy
Utilizing Sideband Kelvin Probe Force Microscopy for Surface Potential Imaging

Utilizing Sideband Kelvin Probe Force Microscopy for Surface Potential Imaging
Utilizing Park System's SECCM for Nanoscale Electrochemical Studies

Utilizing Park System's SECCM for Nanoscale Electrochemical Studies
Polymer Thin Films: High Resolution Phase Imaging

Polymer Thin Films: High Resolution Phase Imaging
Dual Frequency Resonance Tracking: Stabilizing the Piezoresponse

Dual Frequency Resonance Tracking: Stabilizing the Piezoresponse
Using Scanning Spreading Resistance Microscopy (SSRM) and Scanning Capacitance Microscopy (SCM) for Carrier Profiling in Vacuum

Using Scanning Spreading Resistance Microscopy (SSRM) and Scanning Capacitance Microscopy (SCM) for Carrier Profiling in Vacuum
Nanolithography by Contact AFM Based on Anodic Oxidation

Nanolithography by Contact AFM Based on Anodic Oxidation
Atomic Force Microscopy (AFM) Nanolithography: Nanoscale Material Patterning

Atomic Force Microscopy (AFM) Nanolithography: Nanoscale Material Patterning
Advanced Materials in a High Vacuum Environment: Improved Electrical Characterization

Advanced Materials in a High Vacuum Environment: Improved Electrical Characterization
Atomic Force Microscopy (AFM): A Comparison of AM KPFM and Sideband KPFM

Atomic Force Microscopy (AFM): A Comparison of AM KPFM and Sideband KPFM
Using AFM Lithography for Nanopatterning

Using AFM Lithography for Nanopatterning
Using SSRM to Characterize a Li Ion Battery Electrode

Using SSRM to Characterize a Li Ion Battery Electrode
SSRM and SCM for Carrier Profiling in a High Vacuum

SSRM and SCM for Carrier Profiling in a High Vacuum
C-AFM for Current Distribution Mapping of Carbon Nanotube-Embedded Polymer

C-AFM for Current Distribution Mapping of Carbon Nanotube-Embedded Polymer
The Benefits of a High Vacuum for Electrical Scanning Probe Microscopy

The Benefits of a High Vacuum for Electrical Scanning Probe Microscopy
Using FM-KPFM to Enhance Surface Detection

Using FM-KPFM to Enhance Surface Detection
Defecting Surface Recognition on Coating Layers

Defecting Surface Recognition on Coating Layers
Measuring Fixed Cells with AFM and Scanning Ion Conductance Microscopy

Measuring Fixed Cells with AFM and Scanning Ion Conductance Microscopy
An Introduction to Non-Contact Mode AFM Under Ambient Atmosphere

An Introduction to Non-Contact Mode AFM Under Ambient Atmosphere
Characterization of Vacuum Channel Nanoelectronic Devices

Characterization of Vacuum Channel Nanoelectronic Devices
In Situ Monitoring of Copper Electrodeposition Using ECAFM

In Situ Monitoring of Copper Electrodeposition Using ECAFM
Using True Non-Contact Mode AFM for the Imaging of Plasmids in Liquids

Using True Non-Contact Mode AFM for the Imaging of Plasmids in Liquids
Using LFM to Determine the Composition of Materials

Using LFM to Determine the Composition of Materials
How Nanobubbles Effect Engineering Processes and AFM Measurements

How Nanobubbles Effect Engineering Processes and AFM Measurements
Simultaneous Electrochemical and Topographical Mapping

Simultaneous Electrochemical and Topographical Mapping
Using of PFM for Failure Analysis of a Multilayered Ceramic Capacitor

Using of PFM for Failure Analysis of a Multilayered Ceramic Capacitor
Observing Local Electromechanical Responses at Nanometer Levels

Observing Local Electromechanical Responses at Nanometer Levels
Analyzing Semiconductor Device Surfaces and Electrical Properties

Analyzing Semiconductor Device Surfaces and Electrical Properties
Quantification of Elastic Modulus in Materials Using AFM

Quantification of Elastic Modulus in Materials Using AFM
The Role of Atomic Force Microscopy (AFM) in 3D Printing

The Role of Atomic Force Microscopy (AFM) in 3D Printing
An Introduction to Atomic Force Microscopy (AFM) with Ultra-High Resolution

An Introduction to Atomic Force Microscopy (AFM) with Ultra-High Resolution
Three-Dimensional Atomic Force Microscopy

Three-Dimensional Atomic Force Microscopy
Automatic Defect Review AFM for Hard Disk Media Failure Analysis

Automatic Defect Review AFM for Hard Disk Media Failure Analysis
Automated AFM Throughput in Automatic Defect Review

Automated AFM Throughput in Automatic Defect Review
Investigation of Polyester Yarn Interaction with Silicone Matrix

Investigation of Polyester Yarn Interaction with Silicone Matrix
Sub-Angstrom Roughness Measurement Accuracy and Repeatability

Sub-Angstrom Roughness Measurement Accuracy and Repeatability
Revolutionizing AFM with Point-And-Click Imaging Technology

Revolutionizing AFM with Point-And-Click Imaging Technology
Post-Etching Silicon Crystal Defects on a 300 mm Wafer

Post-Etching Silicon Crystal Defects on a 300 mm Wafer
Electrolyte Solution Topography Imaging of Various Organic Samples

Electrolyte Solution Topography Imaging of Various Organic Samples
Measuring Electrical Characteristics of Semiconductor Devices

Measuring Electrical Characteristics of Semiconductor Devices
Cellulose Nanowhiskers Topography and Young’s Modulus Imaging

Cellulose Nanowhiskers Topography and Young’s Modulus Imaging
Fully Automated Atomic Force Microscopy (AFM) Measurement and Analysis

Fully Automated Atomic Force Microscopy (AFM) Measurement and Analysis
High Throughput-High Resolution Sidewall Imaging Using 3D AFM

High Throughput-High Resolution Sidewall Imaging Using 3D AFM
Using Ion Conductance Microscope (ICM) to Image Collagen Fibrils

Using Ion Conductance Microscope (ICM) to Image Collagen Fibrils
Using Ion Conductance Microscopy (ICM) to Measure Cell Volume

Using Ion Conductance Microscopy (ICM) to Measure Cell Volume
True Topography AFM Scanning Using A Low Noise Z-Position Sensor

True Topography AFM Scanning Using A Low Noise Z-Position Sensor
Characterization of Zinc Oxide Nanorod Samples

Characterization of Zinc Oxide Nanorod Samples
Park SmartScan AFM Operating Software

Park SmartScan AFM Operating Software
Non-Contact Mode AFM and Dimensional Nanometrology for Inline Manufacturing

Non-Contact Mode AFM and Dimensional Nanometrology for Inline Manufacturing
NanoScientific Symposium 2022 Now Open for Registration

NanoScientific Symposium 2022 Now Open for Registration
Powerful New Semiconductor Tool Introduced by Park Systems Combines Atomic Force Microscopy with White Light Interferometry

Powerful New Semiconductor Tool Introduced by Park Systems Combines Atomic Force Microscopy with White Light Interferometry
Park Systems Announces Park FX40, the Autonomous AFM with Built-in Intelligence - A Groundbreaking New Class of Atomic Force Microscope

Park Systems Announces Park FX40, the Autonomous AFM with Built-in Intelligence - A Groundbreaking New Class of Atomic Force Microscope

More News

Archived Park Systems News

NX20 AFM for Failure Analysis from Park Systems - MRS 2012

NX20 AFM for Failure Analysis from Park Systems - MRS 2012
The NX10 AFM from Park Systems - The World's Most Accurate Atomic Force Microscope

The NX10 AFM from Park Systems - The World's Most Accurate Atomic Force Microscope
XE-100 Series AFMs from Park Systems

XE-100 Series AFMs from Park Systems
Atomic Force Microscope for the Nanoscale - NX12

Atomic Force Microscope for the Nanoscale - NX12
Park SmartScan AFM Operating Software

Park SmartScan AFM Operating Software
Park Wafer Series Atomic Force Profiler

Park Wafer Series Atomic Force Profiler
Park HDM Series AFM for Media and Substrate Manufacturing

Park HDM Series AFM for Media and Substrate Manufacturing
Park NX20 300 mm AFM for Wafer Measurement and Analysis

Park NX20 300 mm AFM for Wafer Measurement and Analysis
Park NX10 – High Accuracy, Non-Contact Research AFM

Park NX10 – High Accuracy, Non-Contact Research AFM
Park NX20 – AFM for Large Samples and Failure Analysis

Park NX20 – AFM for Large Samples and Failure Analysis
Park Systems NX-3DM Automated AFM System

Park Systems NX-3DM Automated AFM System