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Results 11 - 14 of 14 for Electron beam lithography
  • Nanolithography and Nanofabrication Upgrade Kits: ELPHY Plus
    Equipment
    For all focused electron and ion beam microscopes, Raith’s nanolithography and nanofabrication upgrade kits can enhance SEM or FIB-SEM.
  • Active Magnetic Field Cancellation for Charge-Beamed Instruments
    Equipment
    Mag-NetX is an innovative active control system for the compensation of magnetic field fluctuations, devised for utilization with charged-beam instruments. It has a proprietary analog controller with...
  • Eulitha Nanoimprint Templates
    Equipment
    Eulitha's nanoimprint templates are manufactured with electron beam or its unique EUV lithography technology. Standard templates include 35 nm half-pitch linear gratings and 53 nm half-pitch dot...
  • FIB-SEM - VELION
    Equipment
    Focused Ion Beam or FIB technology is an incredibly adaptable technique for manufacturing some materials.

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