The Triaxis sputtering system is manufactured by engineering talents at Semicore, a Silicon Valley-based manufacturer. It offers a number of accurate coatings for a range of hybrid substrates and materials used by optical, electronic, solar energy, automotive, medical, aerospace, military and other high-tech industries. The Tri-Axis sputtering system is the first economic open-platform design for precise R&D and small batch production. It offers custom formats and a number of standard options.
Key Features
The key features of the Triaxis sputtering system are:
- Vacuum chamber - 304 stainless steel cylindrical chamber, typical size range 18 or 24 inch diameter – scaled to match the specific application
- Pumping - turbomolecular or cryogenic
- Substrate fixture - single, multiple, planetary or custom substrate fixtures
- Substrate holders -Heated, cooled or biased, rotating substrate holder
- Ion source: Substrate pre-cleaning assisted deposition, nanometer-scale modification of surfaces
- Load lock - manual or automatic transfer, high vacuum pumping. Accommodates small samples of various shapes and sized or a single substrate up to 200 mm diameter.
- Process control - PC/PLC-based process automation with graphic user interface, recipe control, data logging and remote e-support
- In-situ monitoring and control - quartz crystal monitoring, optical monitoring, residual gas analyzer and other in-situ measurement and process control
- Tri-Axis deposition techniques - magnetron sputtering, RF, DC, or pulsed-DC, electron beam evaporation, thermal evaporation, organic evaporation for OLED/PLED and organic electronics, glancing angle deposition (GLAD), Cathodic arc plasma deposition, Pulsed laser deposition (PLD)