Nanolithography News

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ZEISS Devlops MeRiT neXT Low Energy-Beam Mask Repair System

The new ZEISS MeRiT neXT mask repair tool hosts the innovative ZEISS low energy ebeam column, which enables the repair of smallest possible clear and opaque defects with the highest accuracy. The low energy beam increases the process resolution and simultaneously reduces side effects.

22 May 2015

Elionix Electron Beam Lithography System to be Installed at CUNY Advanced Science Research Center

SEMTech Solutions, in partnership with Elionix, is pleased to announce the delivery of a 100kV Electron Beam Lithography (EBL) system to the City University of New York’s (CUNY) Advanced Science Research Center (ASRC).

20 May 2015

imec Selects Advantest F7000 Electron-Beam Lithography System for Leuven Research Center

Leading semiconductor equipment supplier Advantest Corporation announces that imec has selected its leading-edge F7000 electron-beam lithography system for installation at their research center in Leuven, Belgium. Imec is a world-renowned center for advanced research in microelectronics which was founded in 1984. The F7000 will be utilized at the nanoelectronics research center to conduct research and development into future leading-edge semiconductor-related technologies.

20 May 2015

Electron-Beam Lithography Systems Supplier, Vistec Electron Beam, Establishes Show Room Facility in Schaumburg, IL

Vistec Electron Beam GmbH, a leading supplier of electron-beam lithography systems, announced today, that it has established a show room facility in Schaumburg, IL to promote and demonstrate their Variable Shaped Beam systems specifically for the US and North America market.

From Vistec Electron Beam 19 May 2015

Heidelberg Instruments Introduces MLA Masskless Aligner Systems

Heidelberg Instruments significantly extends its leadership in manufacturing of direct write lithography systems with the launch of MLA Maskless Aigner series of systems. Low to mid volume lithography traditionally consist of creating designs with a CAD software, followed by fabricating or purchasing a photomask and finally using a mask aligner or stepper to transfer the pattern on to the photoresist. For high volume manufacturing of sub-micron design nodes, this traditional process is required.

4 May 2015

Rudolph Technologies Receives Follow-On Order for Lithography and Inspection Systems

Rudolph Technologies, Inc. announced today that a major outsourced assembly and test (OSAT) manufacturer has placed a $12 million order for a follow-on JetStep® Advanced Packaging Lithography System and multiple NSX® Inspection Systems for use in their planned capacity expansion. The tools, which will ship this quarter and next, will be used in high-performance fan-out wafer level packaging (FOWLP) applications.

From Rudolph Technologies 28 Apr 2015

Applied Materials Introduces Centura Tetra Z Photomask Etch System for Quadruple Nanoscale Patterning

Applied Materials today announced the Applied Centura® Tetra(TM) Z Photomask Etch system for etching next-generation optical lithographic photomasks needed by the industry to continue multiple patterning scaling to the 10nm node and beyond. The new tool extends the capabilities of Applied's industry-leading Tetra platform, delivering angstrom-level photomask accuracy for critical dimension (CD) parameters required to meet stringent patterning specifications for future logic and memory devices.

21 Apr 2015

First-of-its-Kind 450mm Immersion Lithography Tool Installed at SUNY Poly's Albany NanoTech Campus

Governor Andrew M. Cuomo today announced the installation of the world’s first ever 450mm Immersion Scanner has begun at the SUNY Polytechnic Institute's Albany NanoTech Complex. Developed by Nikon Corporation, this first of its kind tool will accelerate the development of the next generation computer chips used in a variety of consumer and commercial applications.

16 Apr 2015

SEMICON Southeast Asia: Advantest to Highlight Nanotechnology Metrology and Lithography Tools

Experience the newest developments in semiconductor test solutions, nanotechnology products and terahertz systems by visiting leading semiconductor test equipment supplier Advantest Corporation's exhibit at SEMICON Southeast Asia. The exposition takes place April 22-24, 2015, at the SPICE Arena in Penang, Malaysia.

16 Apr 2015

Researchers Produce Nanowires Using Meniscus-Mask Lithography

Water is the key component in a Rice University process to reliably create patterns of metallic and semiconducting wires less than 10 nanometers wide.

8 Apr 2015

Nanolithography News

ZEISS Devlops MeRiT neXT Low Energy-Beam Mask Repair System

Elionix Electron Beam Lithography System to be Installed at CUNY Advanced Science Research Center

imec Selects Advantest F7000 Electron-Beam Lithography System for Leuven Research Center

Electron-Beam Lithography Systems Supplier, Vistec Electron Beam, Establishes Show Room Facility in Schaumburg, IL

Heidelberg Instruments Introduces MLA Masskless Aligner Systems

Rudolph Technologies Receives Follow-On Order for Lithography and Inspection Systems

Applied Materials Introduces Centura Tetra Z Photomask Etch System for Quadruple Nanoscale Patterning

First-of-its-Kind 450mm Immersion Lithography Tool Installed at SUNY Poly's Albany NanoTech Campus

SEMICON Southeast Asia: Advantest to Highlight Nanotechnology Metrology and Lithography Tools

Researchers Produce Nanowires Using Meniscus-Mask Lithography

An Extensive Analysis of Environmentally Friendly Nanolubricant Grinding

Papaya Peel Waste Offers Eco-Friendly Photocatalyst Solution

New 2D Polymers Bridge the Gap in Electron Mobility for Organic Semiconductors

Custom Nanoparticles That Can Transport Drugs to the Heart

New Water Filter Upcycles Cellulose for Cleaner Water

Applying AI-Driven Solutions to Semiconductor Digital Design

Redux AFM: Expanding Access to Automated Nanoscale Imaging

Project Pursues Ultra Low-Cost, Flexible Perovskite Solar Cells

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