Nanolithography News

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Breakthrough in Nano Spray Technology

EV Group (EVG) has announced a breakthrough achievement in new photoresist coating technology. With its new Nano Spray technology EVG has been able to demonstrate, for the first time, conformal coatings of vertical via w...

14 Mar 2007

New Simple Electrochemical Process for Direct Patterning of Metallic Interconnects

Creating high-resolution metallic interconnects is an essential part of the fabrication of microchips and other nanoscale devices. Researchers at the University of Illinois at Urbana-Champaign have developed a simple and...

22 Feb 2007

Biologically Inspired Sensors to Augment Sonar, Vision System in Submarines

To find prey and avoid being preyed upon, fish rely on a row of specialized sensory organs along the sides of their bodies, called the lateral line. Now, a research team led by Chang Liu at the University of Illinois at ...

22 Feb 2007

Massively Parallel Dip-Pen Nanolithography of Heterogeneous Supported Phospholipid Multilayer Patterns

An international team of investigators based in the United States and Germany has modified the nanoscale printing technique known as dip-pen nanolithography to create large numbers of model cell membranes. This method, p...

22 Feb 2007

Canon Acquires Exclusive Sales Right of Obducat's Nano Imprint Lithography Equipment

Canon has announced that it has signed an exclusive distribution agreement with Obducat. The agreement gives CMJ the exclusive rights to sell Obducat’s Nano Imprint Lithography equipment in Japan. Canon Marketing J...

From Obducat AB 13 Feb 2007

Molecular Imprints Announces Imprio 1100 Precision Imprint Lithography System

Molecular Imprints, Inc. (MII) has unveiled the latest addition to its Imprio line of imprint lithography tools today at the Strategies in Light trade conference. The Imprio 1100 Precision Imprint Lithography System is a...

13 Feb 2007

EV Group and GenISys Form Collaboration on Advanced Mask Aligner Lithography Simulation for MEMS

EV Group (EVG) announced it has formed a collaborative product development partnership with GenISys GmbH for the development and marketing of a simulation platform for advanced mask aligner lithography processes. The fir...

From EV Group 13 Feb 2007

Obducat Awarded Chinese Patent for Electron Beam Recording Technology

OBDUCAT AB, the world-leading supplier of lithography solutions based on Nano Imprint Lithography and E-beam lithography, is pleased to announce that a new patent have been granted. The Chinese Patent Office has issued a...

From Obducat AB 7 Feb 2007

Novel Approach to Synthesizing Nanowires

A novel approach to synthesizing nanowires (NWs) allows their direct integration with microelectronic systems for the first time, as well as their ability to act as highly sensitive biomolecule detectors that could revol...

6 Feb 2007

Microcontact Insertion Printing

A new process for creating patterns of individual molecules on a surface combines control of self-assembled monolayers (SAMs) and a soft-lithography technique known as microcontact printing. Scientists use the process, k...

6 Feb 2007