Cabot Microelectronics
Corporation (Nasdaq: CCMP), the world's leading supplier of chemical mechanical
planarization (CMP) polishing slurries and growing CMP pad supplier to the semiconductor
industry, announced today that it has received an Outstanding Supplier Award
for the second consecutive year from Taiwan-based Inotera Memories, Inc. (Inotera)
for supplying CMP polishing slurries. This award is granted to suppliers who
demonstrate excellence across a variety of areas, including product quality,
cost of ownership, on-time delivery, world-class service, and a commitment to
technology and safety.
William Noglows, Chairman and CEO of Cabot Microelectronics commented, “It
is an honor to receive this award, which we believe reflects our strong commitment
to help Inotera maintain its zero defects principle. As part of our three key
initiatives of Technology Leadership, Operations Excellence and Connecting with
Customers, we aim to continue to supply consistent, high performing products
and provide responsive technical support to meet and exceed the needs of our
customers.”
Charles Kau, President of Inotera Memories stated, “The success of Inotera
cannot be achieved without close cooperation with our important partners; hence
the annual outstanding supplier is awarded in return for great performance and
contributions from Cabot Microelectronics in this past year”.
Cabot Microelectronics Corporation, headquartered in Aurora, Illinois, is the
world's leading supplier of CMP polishing slurries and growing CMP pad supplier
to the semiconductor industry. The company's products play a critical role in
the production of the most advanced semiconductor devices, enabling the manufacture
of smaller, faster and more complex devices by its customers. Since becoming
an independent public company in 2000, the company has grown to approximately
900 employees globally. The company's vision is to become the world leader in
shaping, enabling and enhancing the performance of surfaces, so the company
is leveraging its expertise in CMP slurry formulation, materials and polishing
techniques developed for the semiconductor industry and applying it to demanding
surface modification applications in other industries where shaping, enabling
and enhancing the performance of surfaces is critical to success.