Since its introduction earlier this year, the 35 nm half-pitch grating template
has been used by many customers around the world and in collaborative projects
of EULITHA.
SEM image of a nanoimprinted pattern in PMMA resist. Imprint performed on a Hex03 tool from Jenoptik (M. Altana, H. Schift, INKA).
The introductory standard template having a patterned area of 2.4 mm2 is popular
with researchers in need of high resolution line structures or engaged in the
development of nanoimprint processes. Large area custom made versions covering
centimeter square areas are sought in studies in biology, and magnetic and optical
properties of materials.
The Institute for Polymer Nanostructures (known with its German acronym - INKA)
in Switzerland utilized the structures to test their Nanoimprint and Nano-injection
molding processes. In another study the templates were recently used by the
EV Group of Austria to demonstrate their process for producing low cost plastic
replica templates. This joint work will be presented at the NNT conference later
this fall in San Jose, California.
EULITHA was founded in 2006 in the canton Aargau of Switzerland. Its founders
have played critical roles in the development of Extreme Ultraviolet Interference
Technology at the Paul Scherrer Institut. The company aims to serve nano-structuring
needs of targeted applications through this breakthrough technology. At present,
it provides products as samples for nanotechnology R&D.