was founded in 2006 in the canton Aargau of Switzerland. Its founders have played
critical roles in the development of Extreme
Ultraviolet Interference Technology at the Paul Scherrer Institut. The company
aims to serve nano-structuring needs of targeted applications through this breakthrough
technology. At present, it provides products as samples for nanotechnology R&D.
produces high-quality nanostructures using advanced lithography techniques.
The resolution of the structures it offers extends down to sub-20 nm region.
fabrication for periodic nanostructures is based on its record-breaking Extreme
Ultraviolet Interference lithography EUV-IL technology. The method uses
light at a wavelength of about 13 nm. One-dimensional linear gratings and two-dimensional
dot arrays or grids are available from EUV-IL.
In addition, Eulitha
has state of the art electron-beam
lithography capability to manufacture arbitrary nanostructures for a variety
aims to provide the best quality periodic nanostructures required both by the
industry and research and development community. Contact Eulitha
to find out how your application may benefit from our unique products.