Whether you are investigating magnetic properties of novel materials on nanometer
scale or wanting to observe how cells behave when they are forced to live on
a surface with nanometer scale corrugations the bottleneck is often producing
high-resolution patterns over sufficiently large areas.
Accomplishing this task with conventional tools such as e-beam lithography
quickly becomes unaffordable when areas larger than a mere square-millimeter
are needed. Eulitha’s
unique EUV-IL technology provides the solution thanks to its high throughput.
Our engineers have recently demonstrated this capability by step-and-repeat
exposures to cover large areas according to customer specifications (see image).
This nano-grating pattern would have taken up to 10 hours to write with a
state-of-the-art e-beam tool. The successful exposures also proved the reproducibility
of the exposure process. Armed with the newly upgraded EUV-IL tool Eulitha is
looking forward to fulfill customers’ requests for even larger area nano-patterns.
EULITHA was founded in 2006 in the canton Aargau of Switzerland. Its founders
have played critical roles in the development of Extreme Ultraviolet Interference
Technology at the Paul Scherrer Institut. The company aims to serve nano-structuring
needs of targeted applications through this breakthrough technology. At present,
it provides products as samples for nanotechnology R&D.