While capitalizing on its breakthrough EUV technology for producing large
area periodic nano-structures, we also serve researchers who require arbitrary
structures with e-beam lithography.
EULITHA has started making
nanostructures with a state-of-the-art e-beam system (Vistec EBPG 5000ES) that
was recently installed at the cleanrooms of the Paul Scherrer Institute where
EULITHA’s production takes place. The new machine together with a LION
LV-1 low voltage machine gives us the ability to manufacture structures with
resolution down to 20 nm with quick turnaround times.
EULITHA was founded in 2006 in the canton Aargau of Switzerland. Its founders
have played critical roles in the development of Extreme Ultraviolet Interference
Technology at the Paul Scherrer Institut. The company aims to serve nano-structuring
needs of targeted applications through this breakthrough technology. At present,
it provides products as samples for nanotechnology R&D.