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New e-Beam Machine Boosts Production Capability and Capacity

Published on September 3, 2009 at 11:03 PM

While capitalizing on its breakthrough EUV technology for producing large area periodic nano-structures, we also serve researchers who require arbitrary structures with e-beam lithography.

EULITHA has started making nanostructures with a state-of-the-art e-beam system (Vistec EBPG 5000ES) that was recently installed at the cleanrooms of the Paul Scherrer Institute where EULITHA’s production takes place. The new machine together with a LION LV-1 low voltage machine gives us the ability to manufacture structures with resolution down to 20 nm with quick turnaround times.

EULITHA was founded in 2006 in the canton Aargau of Switzerland. Its founders have played critical roles in the development of Extreme Ultraviolet Interference Technology at the Paul Scherrer Institut. The company aims to serve nano-structuring needs of targeted applications through this breakthrough technology. At present, it provides products as samples for nanotechnology R&D.

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