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High Attendance at Workshop on Aberration Corrected Electron Microscopy

Published on February 22, 2010 at 6:20 PM

A workshop on aberration corrected electron microscopy was sponsored recently by Carl Zeiss at Harvard University. The workshop attendance was unexpectedly high. Organizers had to move the roughly 100 attendees to a much larger lecture hall than originally planned.

Prof. Frans Spaepen, Interim Director of the CNS (Center for Nanoscale Systems) said: “The workshop on aberration-corrected electron microscopy at CNS was a great success. It was the culmination point of our collaboration with Carl Zeiss to bring electron microscopy at Harvard to the leading edge. The Workshop featured highly instructive and forward-looking talks by the foremost experts in aberration correction, including several from Carl Zeiss, as well as hands-on demonstrations the next day. I was very pleased with the interest from both inside and outside Harvard, and I thank the scientists, engineers and managers at Carl Zeiss for helping to make this possible.”

On the first day, internationally renowned experts in the field gave lectures on the background, theory, implementation and applications of aberration correction in TEM and STEM. The second day focused on seminars, discussion meetings and student tutorials on the two newly installed ZEISS Libra 200 Monochromated Aberration Corrected Electron Microscopes at Harvard University. These are located in the Center for Nanoscale Systems.

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