A workshop on aberration corrected electron microscopy was sponsored recently
by Carl Zeiss at Harvard
University. The workshop attendance was unexpectedly high. Organizers had to
move the roughly 100 attendees to a much larger lecture hall than originally
planned.
Prof. Frans Spaepen, Interim Director of the CNS (Center for Nanoscale Systems)
said: “The workshop on aberration-corrected electron microscopy at CNS
was a great success. It was the culmination point of our collaboration with
Carl Zeiss to bring electron microscopy at Harvard to the leading edge. The
Workshop featured highly instructive and forward-looking talks by the foremost
experts in aberration correction, including several from Carl Zeiss, as well
as hands-on demonstrations the next day. I was very pleased with the interest
from both inside and outside Harvard, and I thank the scientists, engineers
and managers at Carl Zeiss for helping to make this possible.”
On the first day, internationally renowned experts in the field gave lectures
on the background, theory, implementation and applications of aberration correction
in TEM and STEM. The second day focused on seminars, discussion meetings and
student tutorials on the two newly installed ZEISS Libra 200 Monochromated Aberration
Corrected Electron Microscopes at Harvard University. These are located in the
Center for Nanoscale Systems.