With the aim of bringing together visionary leadership to garner the support
of industry stakeholders on next-generation lithography technologies, SEMATECH
announced today that Gary Patton, vice president, of IBM Semiconductor Research
and Development Center, and Suresh Venkatesan, vice president, Alliance Technology
Development of GLOBALFOUNDRIES, have joined the slate of industry speakers at
SEMATECH's Litho Forum.
The event, to be held May 10--12, at the Marriott Marquis in New York, NY,
is a unique opportunity for attendees to gain valuable insights into the challenges
of and investigate realistic approaches to the development of next-generation
lithography technologies.
"The range of speakers at this year's Litho Forum reflects the industry's
recognition that we are at a critical juncture in finding solutions for the
business and technical challenges facing lithography," said Bryan Rice,
director of Lithography at SEMATECH. "Their participation provides an invaluable
contribution to the industry by sharing perspectives and insights that address
the full spectrum of business and technical challenges that remain to advance
the industry."
The forum will kick-off on Tuesday, May 11, with keynote speaker Gary Patton
sharing his perspectives on why scaling and technology advancement are both
still imperatives for today's semiconductor manufacturers despite increasing
costs.
Discussions aimed at finding solutions to the business and technical challenges
confronting lithography will continue on Tuesday afternoon with a plenary session
entitled "Affording the Roadmap." GLOBALFOUNDRIES' Suresh Venkatesan
will join a lineup of senior industry executives from Qualcomm, SEMATECH, IMEC,
Intel, TSMC, Samsung, Texas Instruments, and Semiconductor Industry Association
to exchange innovative strategies that have enabled them to develop cutting-edge
technology solutions while maintaining profitability.
On Wednesday, May 12, academic leaders and equipment and materials suppliers
from Hitachi, IBM, TSMC, the University of Wisconsin, Tokyo Electron Limited,
and GLOBALFOUNDRIES will share progress and prospects for current, new, and
alternative technologies. That afternoon, speakers from Applied Materials, ASML,
KLA-Tencor, AZ Electronic Materials, Dow Chemical Company, Photronics, Molecular
Imprints, Nikon, and Toshiba will discuss economic challenges for litho equipment
makers in areas such as the supply chain, industry consolidation, and other
cost constraints.
The two-day forum will be divided into business and technical perspectives
focusing on government-industry alliances that support innovation, collaborations
to share capital costs, prospects for new and alternative technologies, and
real-life ways companies have been forced to change to maintain profitability
amid escalating R&D costs. Topics covered will include industry consolidation
and collaboration, cost pressures, innovations to keep technology affordable,
and recent technical advances as well as remaining challenges/potential showstoppers.
Additionally, SEMATECH's Litho Forum will offer attendees the opportunity to
participate in the forum survey, a real-time assessment of the status and direction
of next-generation lithography technologies. The survey results, which provide
an industry-wide representation of the perceptions of both strategic decision
makers and technologists on the health of lithography options, will be presented
at the closing dinner of the forum.
Visit SEMATECH's website www.sematech.org
to learn more about the conference or to register for this event.