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Veeco Introduces NEXUS TAMR Physical Vapor Deposition System

Published on June 16, 2010 at 8:37 AM

Veeco Instruments Inc. (Nasdaq: VECO) announced today the introduction of the NEXUS(R) TAMR Physical Vapor Deposition (PVD) System for next-generation Thermal Assisted Magnetic Recording (TAMR), also known as Heat Assisted Magnetic Recording (HAMR).

The new system and Veeco's proprietary process deposits a critical optical structure in the read-write head that conducts the heat source used in TAMR. Veeco also announced that a global hard disk drive manufacturer has placed an order for this PVD system to support its deployment of this key technology.

Robert P. Oates, Executive Vice President of Veeco's Data Storage business, commented, "The hard disk drive industry's roadmap requires continued advancement in areal density, and TAMR is widely regarded as the next critical technology to drive densities up to 50 times greater than where the industry is today. Veeco is partnering with our key customers to qualify our new system for production, and we currently expect to receive additional tool orders from multiple customers as the industry adopts TAMR."

The Veeco NEXUS TAMR PVD System deposits critical low-loss films that make the optical waveguide of the laser. It features heated deposition capability of the oxide films in "dielectric" and "metal modes" of operation. These innovations enable high deposition rates and low optical loss tantalum pentoxide (Ta2O5) and aluminum oxide (Al2O3)films. The Veeco TAMR PVD System leverages Veeco's production-proven high rate reactive alumina platform and proprietary process control.

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