Zeiss today introduced a new Gas Injection System for the ORION® Plus
Helium Ion Microscope. The combination of a sub-nanometer (less than 0.35nm)
probe of inert gas ions with a small interaction volume at the sample surface
enables highly precise induction chemistries. The resulting structures have
extremely small dimen- sions and high profile fidelity. This breakthrough technology
is being unveiled at the M&M 2010 Conference in Portland, Oregon, August
Dr. Paul Alkemade at the Kavli Institute of Nano- science, Delft University
of Technology, is one of the early researchers in helium ion-induced de- position
and etching. According to Dr. Alkemade, "The optimum instrument for nanofabrication
requires both high spatial resolution and high deposition efficiency. Fortunately,
the Helium ion beam on the ORION Plus instrument provides resolution for deposition
that is even better than that achieved by a scanning electron microscope (SEM).
In addition, the Helium ion beam provides deposition efficiencies that are very
similar to those achieved with a heavy ion (Ga) focused ion beam (FIB) instrument.
With the integration of a Gas Injection System, the ORION Helium Ion Microscope
is proving to be the right instrument for nanofabrication research."
The controls for the Gas Injection System (GIS) are seamlessly integrated through
the ORION Plus system software. The GIS unit contains three crucibles capable
of delivering metal and insulator deposition and insulator etch chemistries.
User programmable recipes can be created and recalled allowing for complex deposition
and etch processes. The Gas Injection System on the Orion Plus creates a powerful
and flexible platform enabling state-of-the-art nanofabrication applications.
To learn more about this exciting development, please visit Carl Zeiss SMT
at booth 1274 at the M&M 2010 Conference in Portland, Oregon, or contact
your Carl Zeiss SMT sales representative.