Posted in | News | Nanoelectronics

FSI International Wins Additional Order for ANTARES Single-Wafer Cleaning Systems

FSI International, Inc. (Nasdaq: FSII) announced today that a leading Asia-based logic device producer has placed an additional order for multiple ANTARES® CryoKinetic cleaning systems.

Once delivered, this will significantly expand the platform’s installed base at this customer. The logic chip provider currently uses the ANTARES system for various BEOL particle removal processes, including inline probe testing. Unlike aqueous technologies, CryoKinetic cleaning technology is uniquely qualified for this application because of its all-dry defect removal method. The systems are expected to ship in the second and third quarters of fiscal 2011. The dual process chamber ANTARES systems range in price from $1.8 to $2.3 million, depending on configuration.

The ANTARES® System is a fully automated, single-wafer, CryoKinetic system used for processing 200/300mm wafers with capabilities to remove nanoscale particles. CryoKinetic processing technology is an all-dry, non-reactive process that removes particles through impact by high-velocity cryogenic Ar/N2 aerosol, and reduces defects without damaging the wafer surface, even on copper and porous low-k films. The system’s highly efficient dry cleaning solution can be used for a variety of particle removal applications in FEOL and BEOL. Many of the leading logic device manufacturers worldwide utilize the ANTARES system for its defect reduction and yield improvement benefits.

Source: http://www.fsi-intl.com/

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