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Vistec Installs Electron Beam Lithography System at MCN

Published on March 31, 2011 at 5:22 AM

By Cameron Chai

Vistec Lithography announces that the Australia-based Melbourne Centre for Nanofabrication (MCN) has successfully installed the EBPG5000pES electron beam lithography system.

The newly formed institute will use the system for its research work on nanostructures and for developing innovative technologies.

EBPG5000pES Lithography system

MCN has been established as a result of collaboration between the University of Melbourne, the Commonwealth Scientific and Industrial Research Organisation (CSIRO), LaTrobe University, the Royal Melbourne Institute of Technology, Deakin University, Swinburne University, and the Victorian and Federal Government.

Vistec’s EBPG5000pES system is designed with reliable and state-of-the-art architecture and it features a 100kV electron-optics that allows generation of nano-lithography structures with less than eight nm size. Graphical user interface is another feature of the instrument, which makes them ideal for use in multiuser, diverse, and university type of environments.

A senior research strategist at MCN, Doctor Abid Khan states that the institute will benefit from Vistec’s nanotechnology instrument and the current investment promises forward growth in nano-research. Dr. Khan also explains that with the help of EBPG5000pES electron beam system, etching and writing on surfaces can be done in a very small size. This process is used for manufacturing x-ray optical elements and micro- and nanofluidic devices, micro-texturing of surfaces, and many other applications.

Vistec’s general manager, Rainer Schmid, comments that the company’s EBPG system has successfully passed all customer acceptance tests and the latest test shows that Vistec’s lithography products are right choice for research institutes and universities.

Source: http://www.vistec-semi.com/

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