Market analyst, Research and Markets, has recently added a new book titled, ‘Lithography,’ published by John Wiley and Sons to their catalog.
Rapid speeds, cost -effectiveness and nano-scale solutions constitute the nano-world and all the devices related to it. Moore’s Law, especially in the Microelectronics scenario, has resulted in a rapid rate of technological development in an endeavor to derive more densely designed circuit parts and products embedded on computer chip wafers.
Lithography originally is the procedure of printing with the use of stone and later on, on metal plates. Presently, it is a complicated tool and is based on the idea of imprinting a primary template onto large volumes by utilizing optical exposure, etching and masking methods. Lithography also includes contact with X-rays, high power UV light and electron beams in techniques designed to produce products used in everyday life such as in telecommunications, consumer electronics, transportation and entertainment.. The book offers a synopsis and analyzes important technological developments and applications in an in-depth fashion in several fields that includes optics, physics, mechanics, fluidics and chemistry.
The book also includes chapters on key technologies and techniques such as masking, use of polymer coatings, exposure wavelength control and minimization. The book also analyzes how gaining expertise in the effects of diffraction has caused advances in the field of lithography. The book also covers important and latest tools, future challenges and probable solutions. Key topics discussed are the focused ion beam (FIB) technology development, nano-printing, self-assembly techniques, and the potential of stacked or three-dimensional lithography.
The book has been targeted at engineers and researchers, students and non-specialists, enabling them to enhance their knowledge and awareness on technologies that are rapidly evolving and advancing.
Source: http://www.researchandmarkets.com