Ann Arbor-based University of Michigan has declared Olympus America as its major partner for its Lurie Nanofabrication Facility (LNF). Olympus will offer researchers improved camera equipment, software, and microscopes to enhance their investigation, measurement, characterization, optical imaging, and inspection needs.
The other name for LNF is Michigan Nanofabrication Facility. It is one among the 14 educational centers in the National Nanotechnology Infrastructure Network supported by National Science Foundation.
The facility includes work space of more than 12,500 sq. ft. with well-developed class of 1000 or 100 or 10 cleanroom installations providing 150 mm processing capacity, and a class 10,000 instructional laboratory. Every year, nearly 250 students from inside and outside Michigan University are imparted knowledge in micro- and nano-fabrication, environmental sciences, sensors and geosciences at LNF. Devices and techniques suitable for research on nano-imprint technology, MEMS, silicon integrated circuits, III-V compound devices, and organic devices are made available at LNF.
LEXT OLS4000, a laser scanning three-dimensional measuring microscope which is confocal in nature, has already been installed at LNF facility by Olympus. LEXT offers accurate dimensional measurement of sub-micron, high-resolution imaging, precise measurement of film thickness, and analysis of non-contact surface with utmost completeness.
The is the world’s first-ever developed dual-confocal, laser-based system, designed to function at 405 nm enabling engineers, researchers, and technicians to precisely measure and draw angles till 85o. It stores samples easily and rapidly that are found to have several reflectivity levels. It provides high -precision and -resolution at repeated analysis as promised by an industrial manufacturer of confocal system.
Source: http://www.olympus.com