Vistec Lithography, B.V. is pleased to announce today that Wuhan National Laboratory for Optoelectronics (WNLO) at the Huazhong University of Science and Technology (HUST) in Wuhan, P.R. of China signed off its electron-beam lithography system Vistec EBPG5000pES.
The WNLO, a national lab in the field of optoelectronics, HUST, a national key university in China, and Vistec Lithography, a leading supplier of electron-beam lithography systems, consider that event as a major milestone in their strategic partnership.
The Vistec EBPG5000pES electron-beam lithography system will enable WNLO to further strengthen its leading position in photonics and optoelectronics research and development. "The EBPG5000pES facilitates us to achieve all the lithography challenges we are facing in our research. In respect to application support and service we know that we can count on the Vistec team as our strategic partner", stated Prof. Jinsong Xia, director of the Optoelectronic Micro & Nano Fabrication and Characterization Facility (OMFC) at WNLO.
The Vistec EBPG5000pES is a high-end lithography tool based on reliable and well-proven system architecture. With its flexible electron-optical column and high brightness TFE source, allowing 50 and 100kV operation, the system provides a spot size down to <2.2nm, thus enabling nano-lithography structures smaller than 8nm to be routinely generated. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multiuser, university type environments.
"We are very pleased to have reached this significant milestone in our partnership with WNLO at HUST, who can be assured that Vistec will be supporting them to the very best", said Erwin Mueller, Managing Director Vistec Lithography, B.V. "The electron beam lithography system at WNLO is the first operational Vistec EBPG5000pES in the P.R. China, which opens great opportunities to a sustainable business development for Vistec in that region."