Pall is set to display its latest purification and filtration solutions for the semiconductor industry at the SEMICON West exposition to be held in San Francisco between July 10 and 12.
The new line of products will facilitate defect reduction in gas, chemical, ultrapure water, chemical mechanical polishing (CMP) and photolithography applications.
For ultra-high-purity gas applications, Pall has developed the Gaskleen II EL purifier assembly for intermittent process flows of 50 standard liters per minute. Level of molecular contaminants like oxygen and hydrocarbons can be reduced to less than 1 part per billion from a number of gases by filling the assembly with Pall’s AresKleen purification materials. The second product in this line is the ChamberKleen diffusers equipped with NW40 and NW50 flanges. The diffusers facilitate load lock venting for allowing the flow of large volume of gas in a short period and the incorporated filter-pack eliminates particles bigger than 3 nm. The chemical filter line-up includes the Ultipeat SP DR G2 filter and Ultikleen G3 HiT KC Assembly. The former can filter out particles as small as 10 nm and the latter can eliminate particles smaller than 20 nm under very high temperatures.
The Ionkleen CAF purifier is the latest addition to the ultrapure water application segment. The filter can reduce trace metal ions concentration to less than 1 parts per trillion and facilitate a 20-liters per minute flow rate. The Profile nano filter is for use in advanced CMP processes such as barrier copper and shallow trench isolation. With particle removal efficiency higher than 99 percent at 200 nm, the filter can isolate both colloidal silica slurries with low solids and ceria. For photolithography applications, the company has introduced the 2 nm PE-kleen filter and Nylon Extension filters in a range of capsule and cartridge configurations.
Source: http://www.pall.com/
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