Oxford Instruments Plasma Technology & MIT's Microsystems Technology Laboratories (MTL), Cambridge, MA announce a seminar which will address the latest research and technologies in plasma etch deposition and growth.
This 1 day event on 5th December, at the MIT campus in Cambridge, MA, will be comprised of presentations, discussions, and a networking lunch, focussing on latest innovations.
"We've been hosting these successful seminars worldwide for several years, most recently in The Molecular Foundry, LBNL, Caltech, USA and Shanghai, China, and we typically attract a large number of participants to each event", says Stuart Mitchell, VP Sales for Oxford Instruments America Inc, "These workshops provide an ideal opportunity for academic and industrial technologists to network and share ideas, and we are delighted to be holding this joint workshop with Microsystems Technology Laboratories."
Image credit: Oxford Instruments.
The Seminar will include speakers from key international research institutes, who will discuss their research: Prof. Erwin Kessels, Technical University Eindhoven; Vince Genova, Cornell University. In addition, experts in their field from Oxford Instruments & MTL will speak about recent process and applications developments in a number of plasma processing areas.
Presentations cover a full day and currently include:
- ALD applications
- An Overview of Plasma ALD process
- MEMS process
- Nanoscale dielectric etching
- PECVD & TEOS
Dr. Vicky Diadiuk, Associate Director, Operations, at MTL, "This event at MTL will allow our students and researchers to learn more about Atomic Layer Deposition and plasma processing, from the experts at Oxford Instruments, while also attracting participants from the wider technical community. We look forward to welcoming guests to MIT for what promises to be a full and interesting day. "
This seminar is free of charge, but must be booked in advance as places are limited. To book a place or receive further information, email: firstname.lastname@example.org.
About Oxford Instruments plc
Oxford Instruments designs, supplies and supports high-technology tools and systems with a focus on research and industrial applications. It provides solutions needed to advance fundamental physics research and its transfer into commercial nanotechnology applications. Innovation has been the driving force behind Oxford Instruments' growth and success for over 50 years, and its strategy is to effect the successful commercialisation of these ideas by bringing them to market in a timely and customer-focused fashion.
The first technology business to be spun out from Oxford University over fifty years ago, Oxford Instruments is now a global company with over 1900 staff worldwide and is listed on the FTSE250 index of the London Stock Exchange (OXIG). Its objective is to be the leading provider of new generation tools and systems for the research and industrial sectors.
This involves the combination of core technologies in areas such as low temperature, high magnetic field and ultra high vacuum environments, Nuclear Magnetic Resonance, X-ray, electron and optical based metrology, and advanced growth, deposition and etching.
Oxford Instruments aims to pursue responsible development and deeper understanding of our world through science and technology. Its products, expertise, and ideas address global issues such as energy, environment, security and health.
About Oxford Instruments Plasma Technology
Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for nanometre layer epitaxial growth of compound semiconductor material, etching of nanometre sized features and the controlled growth of nanostructures. These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, and atomic layer deposition. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.