Posted in | Nanofabrication

SMIC Holds Advanced Technology Workshop on 40nm and 28nm Design Solutions in Shanghai

Published on May 31, 2013 at 8:01 AM

Semiconductor Manufacturing International Corporation ("SMIC";), mainland China's largest and most advanced semiconductor foundry, held its 2013, also the 5th, advanced technology workshop in Shanghai today.

The workshop offered 40nm and 28nm IP and design solutions, and provided customers a chance for direct communication to promote technological innovation and cooperation. John Peng, Vice President and General Manager of SMIC's China Business Unit, mentioned in the opening speech that SMIC's 28nm will be ready for new tape-out in 2013, and its 20/14nm development is in preparation. Peng also addressed the importance of the China market and its growing share of SMIC's business. In addition, Tianshen Tang, Senior Vice President of SMIC Design Service, introduced SMIC's 40nm and 28nm technology and IP development roadmap to give insight on SMIC's value-added technologies and services. The workshop showcased SMIC's most up-to-date technology achievements on 40nm and 28nm, 40nm design and tape-out methodologies, eNVM platform for China market, SMIC foundation IP and special IP platforms, SMIC RF spice model and PDK introduction, and more.

The workshop focused on 40nm and 28nm advanced nodes, with more than 200 invited senior IC design engineers in attendance. Executives and representatives from ARM, Ansys/Apache, BriteSemi, Cadence, Mentor Graphics, Innosilicon, Synopsys, and other SMIC partners also gave presentations on their IP offerings, design solutions, and application platforms.

Peng marked the end of the event by thanking the attendees for their continued support and expressing SMIC's commitment to working closely with its customers to achieve further success.

The workshop also featured an exhibition with SMIC partners displaying their products and services, including libraries and IP, EDA tools, and design services.

Source: http://www.smics.com/

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