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Advanced Semiconductor Metrology Equipment Boosted with Nanometrics Launch of Atlas XP Metrology System

Published on April 4, 2008 at 1:58 PM

Nanometrics Incorporated, a leading supplier of advanced metrology equipment to the semiconductor industry, today introduced the latest addition to its Atlas® metrology system platform, the Atlas XP.

“We are committed to aligning our product and technology roadmaps to industry timelines and customer requirements,” said Dr. Timothy J. Stultz, Nanometrics’ president and chief executive officer. “With advanced technology and system capabilities, the Atlas XP delivers leading edge performance to our customers, enabling them to meet their own technology and competitive challenges.”

The Atlas XP incorporates a number of system improvements which result in smaller target measurement capabilities, increased precision, and improved long-term measurement stability and system reliability. Combining the very latest small spot UV Spectroscopic Ellipsometer (SE) and Normal Incidence Spectroscopic Reflectometry (SR), the Atlas XP addresses 45nm and 32nm precision and fleet matching requirements.

“The addition of the Atlas XP extends value and continuity to existing customers transitioning to next level technology nodes,” said David Doyle, Nanometrics’ director of Standalone Metrology Business. “Nanometrics offers the best combination of high performance technology, low cost of ownership and product extendibility. This has been the cornerstone of our development strategy.”

According to the company, the Atlas XP is designed to enable existing customers to seamlessly upgrade through modular system upgrade packages. This allows previous generation system owners the opportunity to immediately realize the most current product enhancements for their thin film and OCD metrology applications.

Like its predecessor, the Atlas XP system is also designed to easily incorporate Nanometrics’ latest NanoCD™ Suite, a turnkey OCD metrology application. Together, this implementation addresses the most demanding OCD applications on a single system platform that leverages the combination of both SE and SR technologies in the measurement.

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