The NanoSpace UHV FIB-SEM from TESCAN is a versatile, easy-to-use system specifically designed to function under ultra-high vacuum (UHV) conditions.
Users can configure the NanoSpace system either as a scanning electron microscope (SEM) or as a dual-beam platform that incorporates an SEM and a high performance focused ion beam (FIB).
Featuring a modular design, the UHV system allows an array of SEM and FIB columns that match the specific goals and needs of end-users. The system also offers a comprehensive, optimal and customized solution for surface analysis and for FIB nano-machining on samples that need the most rigorous contamination-free environment.
Besides this, the NanoSpace system can be fixed to a UHV-compatible gas injection system (GIS) for local metal deposition and selective etching applications.
A UHV intermediate chamber enables in-situ connection to third-party systems, such as MBE clusters and surface analysis instruments. This connectivity expands the application scope of the NanoSpace system.
- Designed to perform high quality surface analysis
- Full UHV design and contamination-free environment
- Fully modifiable instrument
- High resolution imaging
- Accurate control of samples
- Fully automated instrument
- UHV connection is also available