Carl Zeiss SMT has received the next order for their Photomask Registration and Overlay Metrology System PROVE™ from Samsung Electronics, the Korean Integrated Device Manufacturer. The order was placed consecutively after a recent order from the leading e-beam mask writer supplier NuFlare.
“Considering the current market situation, this is a remarkable success. These orders clearly confirm that PROVE™ with its high resolution 193nm imaging optics is an enabling technology for mask manufacturing at 32nm node and beyond. For strategically operating companies, regardless of whether they are mask writer manufacturers, IDM or mask shops there is no alternative but to work with ZEISS registration technology if they want to meet and exceed their aggressive roadmaps.” states Dr. Oliver Kienzle, Member of the Board at Carl Zeiss SMT´s Semiconductor Metrology Systems division (SMS).
The new metrology system PROVE™ was developed by a team of more than 40 Carl Zeiss SMT engineers and is supported by SEMATECH.