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  • Supplier Profile
    University of Duisburg-Essen / Center for Nanointegration Duisburg-Essen CeNIDE, the Center for Nanointegration Duisburg-Essen, was founded in 2005 as a framework' for the diverse nano-activities...
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    CVD Equipment Corporation designs and manufactures a wide variety of process solutions incorporating temperature, pressure, gas delivery and related safety controls. Our custom equipment solutions...
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    NanoPass Technologies Ltd. was founded in 2000 by Dr. Shuki Yeshurun, a material scientist and an expert in micro system technology (MEMS). Dr. Yeshurun has developed a unique design of microneedles...
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    RASIRC develops products that purify and deliver ultra pure liquids and gases, with a primary focus on water vapor. RASIRC steam generators, humidifiers, and dryers are of critical importance for many...
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    CARBIDE.CA is a carbide wholesaler located in Toronto. We deliver the most advanced materials available to assist our customers in lowering their manufacturing cost. Our customers are world class...
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    At Cline Innovations, LLC, we focus on the synthetic diamond and diamond-like carbon industries. We offer consulting on materials, processing challenges, and industrial marketing. Our equipment...
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    Euris is a European Equipment and Materials Distribution Company servicing the Semiconductor Manufacturing Industry...EURIS provides Full coverage of Europe with one infrastructure with offices in...
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    We at the Leading-Edge Key Technology Business Headquarters transfer technology, offer consulting services, and sell products primarily relating to materials and devices-acting as a bridge between the...
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    Oxonica is one of the leading international nanomaterials groups with products already launched into international markets. The Group’s mission is to develop innovative commercial solutions for...
  • Supplier Profile
    Angstrom Sciences was founded in 1988 by Mark A. Bernick with a corporate mission to supply the most advanced magnetron sputtering cathodes and high purity materials for plasma vapor deposition of...

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