Article - 26 Mar 2012
Height measurement by AFM is crucial in metrology, however it would also benefit from the capability to perform sidewall roughness imaging.
News - 8 Oct 2008
Cadence Design Systems, Inc., the leader in global electronic design innovation, today announced the availability of software that optimizes custom lithographic source illumination, a new capability...
News - 3 Dec 2009
ASML (NASDAQ:ASML)(Amsterdam:ASML), along with its subsidiary Brion Technologies, today announced a broad-scoped joint development project with STMicroelectronics (ST) to accelerate 28-nm node...
News - 14 Jul 2009
Brion Technologies, a division of ASML and an industry leader in computational lithography for integrated circuits, has reached a preferred supplier agreement with Toshiba Corporation to implement a...
News - 22 Oct 2008
Malvern Panalytical is pleased to announce its participation in the newly-formed OPC Analyzer Device Integration Working Group. The group has been constituted to develop a common method for data...
News - 14 Feb 2012
ASML’s division, Brion Technologies has introduced a novel product called Tachyon flexible mask optimization (Tachyon FMO) for semiconductor manufacturers.
Tachyon FMO is part of the Holistic...
News - 23 Sep 2011
D2S has unveiled first-of-a-kind mask-wafer double simulation accelerated workstation called TrueMask DS for hot-spot analysis, bit-cell design, research and development exploration and mask-defect...
News - 20 Sep 2011
ASML's division, Brion Technologies has introduced the Tachyon Model-Based Sub-Resolution Assist Features (MB-SRAF) for its well-known Tachyon computational lithography system to allow full-chip,...
News - 24 Feb 2009
Synopsys, Inc. (NASDAQ:SNPS), a world leader in software and IP for semiconductor design and manufacturing, today announced a joint collaboration with Powerchip and Nikon to deploy the Nikon Scanner...
News - 21 Feb 2009
Brion, a division of ASML, and Cymer Inc. (Nasdaq:CYMI) today announced the successful incorporation of detailed Cymer laser spectral characteristics into Brion's computational lithography models....