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Nanolithography refers to the fabrication of nanometer-scale structures, meaning patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nm. Nanolithography is used during the fabrication of leading-edge semiconductor integrated circuits or nanoelectromechanical systems (NEMS).
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The Vistec SB250 electron beam lithography system is a cost-effective and universal tool for both mask making and direct write applications to enable customers to help customers to respond quickly to market demands.
A fourth-generation design, the NanoLithTM 7000 provides the required output power and stability while providing a highly line-narrowed bandwidth to meet the stringent requirements of high volume production today. The NanoLith 7000 offers a bandwidth of < 0.5 pm FWHM and < 1.3 pm 95 percent energy integral, which enables next-generation scanners with high Numerical Aperture lenses to produce the resolution for sub 100 nm devices.
NEW system for electron beam direct write. Improved stability, a new Digital Pattern Generator and an ultra-high resolution electron optics result in new specifications.
The Vistec SB254 is an advanced electron-beam lithography system that allows the usage for direct write and mask making for a wide range of applications in applied research and industry. The system is cost-effective and delivers excellent performance.
EV Group offers a new automated resist processing system, EVG120, which is specifically designed to process substrates of different shapes and sizes of up to 200 mm.
The DWL 2000 laser lithography system is a fast and flexible, high resolution pattern generator for mask making and direct writing. With a write area of up to 200 x 200 mm2 the system is the perfect solution for fast patterning of masks and wafers in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures.