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Nanolithography refers to the fabrication of nanometer-scale structures, meaning patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nm. Nanolithography is used during the fabrication of leading-edge semiconductor integrated circuits or nanoelectromechanical systems (NEMS).
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Equipment
NEW system for electron beam direct write. Improved stability, a new Digital Pattern Generator and an ultra-high resolution electron optics result in new specifications.
SOKUDO DUO is an innovative photolithography coater/developer that incorporates the world's first dual track system. Featuring dual-flow wafer processing, the SOKUDO DUO dramatically boosts throughput to 250-300 wafers per hour (wph), depending on system configuration, while substantially reducing system footprint. The SOKUDO DUO design improves wafer output per unit area by up to 40% compared to previous track systems.
The DWL 2000 laser lithography system is a fast and flexible, high resolution pattern generator for mask making and direct writing. With a write area of up to 200 x 200 mm2 the system is the perfect solution for fast patterning of masks and wafers in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures.
EV Group offers a new automated resist processing system, EVG120, which is specifically designed to process substrates of different shapes and sizes of up to 200 mm.
The Vistec SB254 is an advanced electron-beam lithography system that allows the usage for direct write and mask making for a wide range of applications in applied research and industry. The system is cost-effective and delivers excellent performance.
A fourth-generation design, the NanoLithTM 7000 provides the required output power and stability while providing a highly line-narrowed bandwidth to meet the stringent requirements of high volume production today. The NanoLith 7000 offers a bandwidth of < 0.5 pm FWHM and < 1.3 pm 95 percent energy integral, which enables next-generation scanners with high Numerical Aperture lenses to produce the resolution for sub 100 nm devices.
The Vistec SB250 electron beam lithography system is a cost-effective and universal tool for both mask making and direct write applications to enable customers to help customers to respond quickly to market demands.