Thin-Film Deposition Systems RSS Feed - Thin-Film Deposition Systems

Thin-film deposition is any technique for depositing a thin film of material onto a substrate. Most deposition techniques allow layer thickness to be controlled within a few tens of nanometers. On the other hand, some techniques allow single layers of atoms to be deposited at a time.
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Featured Equipment
MANTIS offers the HEX modular deposition system that integrates the latest thin film technologies into a compact, bench top platform at reduced cost.
Other Equipment
The SC 1500 inline sputtering system offers an economic, modular and scalable design to meet the requirements of high-volume or pilot production.
VG Scienta offers the GEN IV PPD (Pulsed Plasma Deposition) Source having a small geometrical form factor.
Beneq offers FCS 500, a functional coating system designed for nanoparticle synthesis and coating production.
The Beneq P400A and P800 are ALD systems designed for industrial-scale production. They are ideal tools for scaling-up thin film deposition from R&D phase to full-size industrial production. The systems are dependable, industrially proven and mature in terms of technical distinction. The design is based on 25 years of continuous (24/7) operation in demanding industrial applications.
The Beneq TFS NX300 is an application-specific system designed for fully-automated industrial production of surface passivation on crystalline silicon (c-Si) solar cell wafers. The batch size is 500 pcs, enabling an hourly throughput of 3000 wafers.
EvoVac Series modular thin film systems are the next evolution in vacuum technology, eliminating the need for most custom designed PVD equipment. The one of a kind EvoVac also enables optional glove box integration much like our Åmod Series with one significant difference. The increased vacuum chamber size enables 2-port glove access to its interior improving ergonomics with only a slight increase in overall footprint.
The Q150T is a compact turbomolecular-pumped coating system suitable for SEM, TEM and many thin film applications. It is suited to producing metal or carbon coatings.
The Astronomical Telescope Community has distinguished Dynavac for its ability to construct, design and install large mirror deposition systems.
ESTO has designed Caroline D12B system for magnetron deposition on any flat substrates such as ceramic and silicon with the thickness of less than 30mm and diameter of less than 150mm. Maximum surface processing is 150x350mm.
Designed as a fully modular platform, the EVG150 allows automated spray/spin/develop processess and high-thoroughput performance.
Caroline PE15 system from ESTO is specifically for plasma etching and reactive ion etching of thin films deposited on flat substrates with a thickness of less than30mm and diameter of up to 200mm.
ESTO’s Caroline D12C system is specifically designed for double-sided magnetron deposition on silicon, ceramic or any flat substrates with a thickness of less than 30mm and diameter of less than 150mm. Maximum surface processing is 150x650mm.
The PlasmaPro 1000 Stratum PECVD tool from Oxford Instruments offers excellent benefits for manufacturers of LED.
Caroline D12B2 system available from ESTO is designed for double-sided magnetron deposition on any flat substrates such as silicon, ceramic, etc. with a diameter of less than 150mm and thickness of less than 30mm. Maximum surface processing is 150x350mm.
ESTO has designed Caroline D12B1 system for magnetron deposition of decorative, hardening, and corrosion-resistant coatings on different kinds of parts, such as tools, shells, blades, etc.
Picodeon’s patented coldlab technology and its new Coldab® Series 2 Ultra-short Pulsed Laser Deposition (USPLD) equipment offers the advantage of depositing any type of thin-film layers to any type of substrate materials.
VG Scienta offers a highly dynamic, low temperature organic deposition cell that is specifically designed for research applications.
The Beneq TFS 600 is an application-specific ALD system designed for vacuum-line integrated organic light-emitting diode (OLED) encapsulation. It provides superior ALD thin-film quality while meeting the high throughput, robustness, and reliability requirements of an industrial in-line environment.
The precision optical coating systems from Dynavac offer reliable results regularly every year. Dynavac systems are being used in facilities globally, handling highly advanced optical coating challenges with high reliability and performance.
The Beneq TFS 1200 is an ALD processing module that is integrated into CIGS evaporation or rapid thermal processing (RTP) selenization lines. Deposition time for a 30 nm thick Zn(O,S) buffer layer is less than 5 min. ALD is more compact and less expensive than conventional CBD-CdS buffer layer processes.
Thin film coating in bulk scale production is possible using the Coldlab Series 4. It has a multi-substrate load-lock system which enables continuous coating process without any production stops.
The Capos systems from Semicore uses a cost-effective open platform design configured easily to suit a range of thin film deposition applications, especially for small batch production and research and development.
Semicore, creators and manufacturers of precision thin film vacuum deposition systems and products have in their portfolio the SC250 & SC450 sputtering system which offer high quality, advanced features and is also cost-effective.
The K975X Turbo Evaporator, is a multiple application system to enable a range of preparation techniques to be applied with the flexibility and module expansion capability to develop new methods and prepare new specimens. It allows for Carbon Evaporation, Metal Evaporation from both Baskets and Crucibles and a Sputter Coating option.
The TFS 500 is an ALD system designed for use in thin film coating applications. The unit incorporates leading edge design and technical solutions that enable superior quality coatings and results. In Beneq, we have approached ALD tool design with an open mind and innovative spirit. Our goal is to develop new applications and business opportunities by combining experience with invention. The TFS 500, our initial reactor model, has proven its case as a versatile tool adaptable to both in-depth thin film research and robust batch processing.
The Odyssey 450 Deposition System from Dynavac offers small-scale thin-film production with very good quality results of a large sophisticated system.
ESTO has designed Caroline D12B3 system for double-sided magnetron deposition on any flat substrates such as ceramic, silicon etc. with a thickness of less than 30mm and diameter of less than 150mm. Maximum surface processing is 150x350mm.
The Covap II series offers a compact, economical solution suitable for many process applications. Its small size will ensure you will find space in your lab and your budget. Built to our high quality standards, the Covap II is available with closed loop co-deposition control, recipe storage and a unique clam-shell chamber for improved accessibility.
All Nexdep systems can be built to your needs with custom flexibility, in a compact footprint and at an economical price. Whether your process requires resistive evaporation, sputter deposition or electron beam evaporation, the Nexdep is highly capable.
The SC3500 evaporation system from Semicore is made of stainless steel and is a water cooled process chamber with swing open front access door
Caroline IE12 system available from ESTO is specifically designed for ion beam etching of dielectric and metal films deposited on ceramic, silicon or any flat substrates with a thickness of less than 30mm and diameter of less than 150mm. Maximum surface processing is 150x320mm.
Caroline D12A, an automated deposition system from ESTO, is specifically designed for magnetron, thermal, and ion-beam deposition on any flat substrates such as ceramic, silicon, or glass-ceramic substrates with a diameter of less than 100mm and thickness of less than 30mm.
ESTO has developed Caroline PE12 system for plasma etching and reactive ion etching of thin films deposited on ceramic, silicon or any other flat substrates with a thickness of less than 30mm and diameter up to 250mm.
Caroline D12A1 system, available from ESTO, has been developed for magnetron, thermal and ion-beam deposition on flat substrates such as ceramic, silicon or glass-ceramic substrates with a diameter of less than 100mm and thickness of less than 30mm.
The Åmod line of thin film deposition tools was designed to meet the advanced process requirements of today’s thin film researcher.
VG Scienta offers the OFT EDGE Series of modular systems, which features configurable devices for depositing and assessing organic and inorganic layers on both solid and flexible substrates for device construction.
Dynavac's Spectrum-Pro Optical Monitoring System is an ideal tool for producing complicated, repeatable coatings with a high degree of accuracy.
Caroline PECVD15 system available from ESTO is designed for separate processing of flat substrates with a diameter of less than 200mm.
For more than 3 decades, Dynavac has offered turnkey equipment solutions for large-scale thin film production. Dynavac equipment is installed in manufacturing facilities around the world producing consistent results every year.
VG Scienta’s VacuTRAN is an innovative, vacuum-enabled membrane permeation measurement instrument exclusively designed for the plastic electronics industry.
The QPrep deposition systems available from MANTIS are based on a UHV, conflat flange platform to ensure enhanced pressure performance and ease of use over KF and ISO platforms.
The Nanoshell nanoparticle source from Mantis Deposition is designed to aid in the production of core-shell nanoclusters. The core-shell structures play crucial role in the engineering of material properties on the nano scale.
The Triaxis sputtering system is manufactured by engineering talents at Semicore, a Silicon Valley-based manufacturer.