Atomic Layer Deposition (ALD) Systems

Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. The majority of ALD reactions use two chemicals referred to as precursors. ALD provides a unique method for depositing ultrathin films on surfaces.

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Equipment

P400A and P800 Atomic Layer Deposition System from Beneq

The Beneq P400A and P800 are ALD systems designed for industrial-scale production. They are ideal tools for scaling-up thin film deposition from R&D phase to full-size industrial production. The systems are dependable, industrially proven and mature in terms of technical distinction. The design is based on 25 years of continuous (24/7) operation in demanding industrial applications.

Web Coating System for Roll-to-Roll ALD - WCS 500 from Beneq Oy

For the very first time in ALD history, roll–to–roll has been made viable and accessible for research and industrial production. The Beneq WCS 500 offers true roll–to–roll ALD on flexible webs up to 500 mm in width.

TFS 600 Thin Film Deposition System from Beneq

The Beneq TFS 600 is an application-specific ALD system designed for vacuum-line integrated organic light-emitting diode (OLED) encapsulation. It provides superior ALD thin-film quality while meeting the high throughput, robustness, and reliability requirements of an industrial in-line environment.

Cambridge NanoTech Fiji F200 Atomic Layer Deposition System

The Cambridge NanoTech Fiji F200 series is our most advanced ALD research and development system. The Fiji is a modular high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible system architecture and multiple configurations of precursors and plasma gases. The result is a new generation ALD platform capable of doing thermal as well as plasma-enhanced deposition.

TFS 500 Atomic Layer Deposition System from Beneq

The TFS 500 is an ALD system designed for use in thin film coating applications. The unit incorporates leading edge design and technical solutions that enable superior quality coatings and results. In Beneq, we have approached ALD tool design with an open mind and innovative spirit. Our goal is to develop new applications and business opportunities by combining experience with invention. The TFS 500, our initial reactor model, has proven its case as a versatile tool adaptable to both in-depth thin film research and robust batch processing.

TFS 1200 Thin Film Deposition System from Beneq

The Beneq TFS 1200 is an ALD processing module that is integrated into CIGS evaporation or rapid thermal processing (RTP) selenization lines. Deposition time for a 30 nm thick Zn(O,S) buffer layer is less than 5 min. ALD is more compact and less expensive than conventional CBD-CdS buffer layer processes.

Substrate Heaters by Blue Wave Semiconductors

A leader in supplying well designed and process compatible substrate heaters to our thin film R&D and manufacturing customers working in the areas of electronics, optoelectronics, photonic, microelectronics, environmental science, thin film production and packaging, biotechnology, semiconductors, applied and solid state physics, chemistry, and thin film device engineering and technologies.

Aviza Technology Celsior fxP Single Wafer ALD System

Celsior™fxP is Aviza's advanced generation single wafer ALD system targeted for 300-mm production at the 90-nm node and below. Celsior fxP offers expanded revolutionary features to meet complex manufacturing requirements and the flexibility and short cycle times for R&D.

Cambridge NanoTech Savannah Series Atomic Layer Deposition System

The Savannah comes in three configurations – the S100, S200 and S300. Each one holds substrates of different sizes, up to 300mm for the S300. All come with 2 heated precursors lines, standard, with an option to have up to six precursor lines all capable of handling gas, liquid or solid precursors.

TFS NX300 Thin Film Deposition System from Beneq

The Beneq TFS NX300 is an application-specific system designed for fully-automated industrial production of surface passivation on crystalline silicon (c-Si) solar cell wafers. The batch size is 500 pcs, enabling an hourly throughput of 3000 wafers.

Thin Film System TFS 200 for ALD Research from Beneq Oy

The TFS 200 is the most flexible ALD research platform ever designed for research and development. All details of the system are realized with flexibility, modularity and ease of use in mind. With the TFS 200, the freedom of coating and application development is placed completely in the hands of the operator, not limiting it by system-related restrictions.

ALD 200L Series from Kurt J. Lesker Company

Kurt J. Lesker Company offer stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of our ALD system platforms feature high speed ALD valves and integrated pumping, pressure measurement, and gas delivery packages optimized for your specific process.

Thin Film System TFS 200R for Continuous Mode ALD Research from Beneq Oy

The Beneq TFS 200R is the first-ever system designed for research in Roll-to-Roll atomic layer deposition (ALD) and other forms of continuous ALD (CALD). The TFS 200R is used exclusively for depositing thin films on flexible substrates. For the first time in ALD history, the TFS 200R enables investigation in the dynamic behavior of various precursor chemistries, simulation of process suitability and evaluation of film performance in Roll-to-Roll ALD applications.