AIXTRON AG today announced
that in the fourth quarter 2008 the National Taiwan University (NTU), based
in Taipei City, Taiwan, ordered one Close Coupled Showerhead 3x2" wafer
Research Platform MOCVD system. It will be used for research and development
on GaN and related materials and devices and it will be delivered in the third
quarter 2009.
Professor Chih-Chung (C. C.) Yang of the Institute of Photonics and Optoelectronics,
National Taiwan University, comments: “We have been researching on nitride-based
alloy semiconductors for a number of years. Our experiments require a stable
and reliable system with commonality and compatibility with Taiwan’s popular
production technologies. Not only does AIXTRON’s CCS Research Platform
suit this task very well but it also has a high degree of versatility. In particular,
we are looking forward to using the Dynamic Reactor Height Adjustment option
for growth at various reactor pressures. We are impressed with this unique capability
and expect it will enable us to more rapidly implement our process development
program.”
The AIXTRON Taiwan team is also eager to continuing its role in this project.
AIXTRON Taiwan’s R&D and Process Manager Dr. Joe Yang, who in fact
graduated from NTU in 2003, adds: “Our process team is naturally keen
to ensure that the very best efforts go into this project so we can provide
NTU with a parameter set to form an excellent base for their advanced R&D.”