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Veeco Installs GEN2000 Molecular Beam Epitaxy System at IPG

Published on August 29, 2012 at 5:55 AM

By Cameron Chai

Veeco Instruments, a provider of advanced thin film process technologies including MOCVD, Ion Beam, and Molecular Beam Epitaxy (MBE) for manufacturers of power electronics, wireless chips, MEMS, hard drives, and LEDs, has announced that it has installed a GEN2000 Edge MBE System at IPG Photonics.

IPG Photonics, a global provider of high-power fiber lasers and amplifiers, had earlier acquired three Veeco GEN200 Systems. The latest installation of the new MBE system was to increase its production capabilities for high-quality GaAs-based lasers.

The GEN2000 Edge MBE System enables superior wafer quality even when used for high-capacity production applications. It features a cluster tool architecture that increases throughput and reduces maintenance downtimes and the clean-room space required. It features connected modules that enables growth of various materials. The tool design enables low-cost 7x6” epiwafer growth of various types of devices including, heterojunction bipolar transistors, vertical cavity surface-emitting lasers and pump lasers.

The VP and GM of Veeco's MBE Operations, Jim Northup stated that the new orders received from IPG, an existing customer, prove the performance of the company’s cluster-based systems for manufacturing applications.

IPG’s VP for components, Dr. Alex Ovtchinnikov commented that the company was happy with the performance and the cost of ownership benefits from the GEN200 Systems. IPG required increased throughput and hence it had to acquire a system with higher capacity such as the GEN2000 Edge MBE System.

Source: http://www.veeco.com/

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