First Nano, a division of CVD
Equipment Corporation has announced today the
shipment of our first EasyTube 6000 Chemical Vapor Deposition system.
The multi-tube EasyTube 6000 horizontal system is specifically designed
for the Research, University and Laboratory market and is capable of
processing up to 100 - 6" diameter or smaller wafers. The system is
available with processes for research applications in the
Semiconductor, MEM, Nanotechnology and Solar Cell markets.
The EasyTube 6000 is another addition to our line of EasyTube
systems that are aimed at offering the research community quality
performance, safe operation and production grade equipment at a low
cost of ownership. All EasyTube systems are equipped with our
proprietary WINPRC real-time software to enable optimization of all
process parameters. The EasyTube 6000 has a small footprint, is modular
in design and is offered with Atmospheric and Low- Pressure Chemical
Vapor Deposition processes.
In the fourth quarter of 2007, we will be installing an
EasyTube 6000 in our "Open Laboratory" to further our ongoing
relationships with the research community. The system will be used for
customer demonstration, material processing and developing additional
processes for CNT, Solar and MEM applications. The system will give us
nine (9) operational deposition systems in our laboratory for further
product and materials development.