Nanometrics Incorporated
(Nasdaq: NANO), a leading supplier of advanced process control metrology
systems used primarily in the manufacturing of semiconductors, solar photovoltaics
and high-brightness LEDs, today announced the shipment of a Lynx cluster metrology
system. The system was delivered as a follow-on order to a leading memory manufacturer
as part of its plan for high-volume manufacturing of its latest DRAM and Flash
memory technologies.
“This customer had originally ordered this Lynx system on an expedited
basis in 2008, but subsequently canceled the purchase in response to the deteriorating
market environment at the end of last year. The recent re-issue of the purchase
order and request for immediate insertion into a high-volume production line
is evidence of the importance of our technology to support the ramp of this
customer’s next-generation memory devices,” commented Tim Stultz,
president and chief executive officer.
Nanometrics’ Lynx platform enables its customers to leverage numerous
process control technologies for monitoring steps throughout the manufacturing
process. This Lynx system was equipped with 9010 metrology to support Optical
Critical Dimension (OCD) metrology for control of critical lithography steps
and supports Nanometrics’ 9010 integrated metrology systems. The Lynx
offers future extendibility and productivity improvements at a low cost of ownership,
as it enables integration with additional Nanometrics Thin Film, OCD, and Overlay
metrology solutions for advanced semiconductor manufacturing process control.