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The Search for Solutions to Industry's Most Challenging Issues at 2010 SEMATECH Knowledge Series

Published on January 27, 2010 at 9:50 PM

Semiconductor technologists from a wide range of fields can join the search for solutions to the industry's most challenging issues at the 2010 SEMATECH Knowledge Series (SKS) of meetings, workshops and symposia.

This year's SKS conferences, occurring throughout 2010, will focus on difficult questions in lithography, advanced technologies, manufacturing, and strategy. Included are a new set of meetings on installed-base equipment utilization, and a new interconnect workshop in stress management for 3D chips utilizing through-silicon vias (TSVs). Other SKS meetings—such as the biannual Litho Forum, the Extreme Ultraviolet Lithography (EUVL) Symposium, ISMI Manufacturing Week, and SEMATECH's annual Symposia in Japan and Taiwan—will continue from previous years.

“Our 2010 SKS conferences and workshops offer front-row seats to the industry's newest technology trends, productivity approaches, cost reduction opportunities and best practices,” said Dan Armbrust, SEMATECH President and CEO. “SKS participants can directly take part in shaping the industry's approach to our biggest challenges in litho, front end, interconnect, metrology, productivity and sustainability.”

On the SKS horizon are the Surface Preparation and Cleaning Conference, March 22-24 in Austin, TX and the 2010 Litho Forum, May 10-12 in New York City. Also approaching are Installed-base Equipment Workshops on thermal equipment, March 23 in Austin, and implant equipment, April 20 in Boston, MA. Information on these and other SKS meetings can be found at http://www.sematech.org/meetings/sks.htm.

SKS meetings are highly interactive and allow attendees to:

  • Review and rank critical issues in bringing R&D concepts to high volume manufacturing
  • Focus on ways to extend the use of incumbent materials and technologies
  • Share data and methodologies for lowering costs and improving productivity in current and next-generation fabs, through advances in equipment, processes, resources, design, and manufacturing methods
  • Guide the industry in seeking effective solutions for future technology generations
  • Build on critical university, supplier and manufacturer relationships needed for accelerated innovation

All SKS meetings are open to the public, with several accepting sponsorships and exhibits. Additional meetings may be added during the year.

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