Brewer's New Coating Offers Photoresist Compatibility, Tuned Optical Properties

Published on February 26, 2010 at 4:01 AM

Brewer Science, the leading supplier of advanced lithography materials, is pleased to launch ARC®29L coating, a state-of-the-art ArF immersion bottom anti-reflective coating (BARC) that provides broad photoresist compatibility and tuned optical properties for use as a top layer in a dual-layer BARC stack or as a single layer BARC on SiON.

The ARC®29L unique coating is designed with the widely recognized and proven platform of the Brewer Science® ARC®29SR coating. This advanced new material provides low reflectivities, of less than 0.1% for film thicknesses of less than 40nm. This product is ideal for extending leading-edge immersion processes in both single- and double-patterning lithography schemes.

"ARC®29L coating exceeds the demands for an immersion BARC" says Chris Cox, 193-nm Product Manager for Brewer Science. "As our customers push resolution limits with ArF immersion lithography, minimizing substrate reflectivity becomes more important than ever. The lower k value of ARC®29L coating delivers a novel option for improved reflectivity control on absorbing substrates such as SiON, TiN, SiN, or dual-layer BARCs. Being able to significantly enhance a tried and true BARC platform like the ARC®29SR coating is a tremendous benefit to our customers."

Brewer Science continuously improves leading-edge lithography products to reduce defectivity and outgassing and increase ease of line integration.

Source: http://www.brewerscience.com/

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