A provider of stand alone metrology solutions, Nova Measuring Instruments has obtained multiple orders from customers for its Nova i500 integrated metrology system. The company received the orders after completing a qualification procedure during which the metrology solution showed nearly 30% better performance over previous models in precision and throughput.
For manufacturers to enhance their yield, a thinner wafer-to-wafer process window is required for efficient CMP process control. In order to obtain a thin wafer-to-wafer process window, a high level of tool to tool matching and measurement accuracy is required in a shorter duration of time. In addition to these challenges, there is also an increasing requirement for more number of optical CD measurements. To meet all these challenges, a faster and better optical CD metrology tool is required.
The device’s high throughput enables CMP process control on future polishers that are expected to surpass throughputs of approximately 100 wafers every hour. The continuous size reduction of process windows and high speed wafer processing make the metrology solution an important component for the CMP solution.
The Nova i500 enables customers to enhance their productivity while retaining the design of previous tools. It provides an easy migration path from the company’s previous integrated metrology device, the NovaScan 3090Next.
The company’s Executive Vice-President of the Global Business Group, Eitan Oppenheim stated that there is a requirement for a swift metrology tool that integrates sensitive and accurate metrology performance. He mentioned that the metrology solution’s core technology meets the needs for sophisticated process control in both the memory and foundries market segments.