Cabot Microelectronics is the leading supplier of sophisticated polishing compounds and a provider of polishing pads used in the manufacture of advanced semiconductors (chips) and rigid...
Article - 11 May 2004
Microfluidics, announced that laboratory systems of its patented High-Pressure Multiple Stream Mixer Reactor (MMR) are now available on special order. The MMR produces uniform nanoparticles with phase...
News - 7 Mar 2013
Building on earlier teamwork with Lewis University, Pall Corporation today announced that scientists from both organizations have expanded research into optimizing filtration technology for...
News - 5 Nov 2011
The Lewis University in Illinois and Pall, a provider of filtration, separation and purification solutions for fluid management in life sciences had recently conducted a research study on the...
News - 31 Jul 2008
Corporation, the world’s leading supplier of chemical mechanical planarization
(CMP) polishing slurries to the semiconductor industry, today announced that
News - 6 Mar 2010
Research and Markets (http://www.researchandmarkets.com/research/130a19/the_world_market_f) has announced the addition of the "The World Market for Chemical Mechanical Planarization (CMP) Equipment"...
Article - 18 Oct 2016
Scanning probe microscopy (SPM) is often used in production and research for characterizing statistical properties of surfaces and nano-scale surface roughness of different materials.
News - 4 Dec 2012
Dow Electronic Materials, a business unit of The Dow Chemical Company, today announced two key commercial-ready technologies for leading-edge semiconductor and printed circuit board (PCB)...
News - 5 Sep 2013
EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today unveiled a new polymer via-filling process for...
News - 25 Nov 2009
Corporation (Nasdaq: CCMP), the world's leading supplier of chemical
mechanical planarization (CMP) polishing slurries and growing CMP pad supplier