IMEC today announced that it is extending
its EUV (extreme ultra-violet) lithography research program with a parallel
dedicated EUV mask cleaning research program. The program will build on a new
collaboration between IMEC and HamaTech APE GmbH + Co. KG. HamaTech's
MaskTrack Pro® photomask processing system has been selected as the cleaning
tool of record and will be installed at IMEC's 300mm clean room where
the companies will perform collaborative research to reach the stringent mask
integrity requirements of EUV lithography. This collaboration enables IMEC to
offer interested partners innovative mask cleaning technology to develop processes
of record (PORs) to extend their EUV lithography research.
Unlike photomasks used in optical lithography today, EUV masks will most likely
not have pellicles making the mask sensitive to particle and organic contamination.
Consequently, cleaning EUV masks close to Point-of-Exposure in the wafer fab
reduces the risk of yield loss due to added particles or organic contamination
growth.
IMEC's mask cleaning program will develop processes of record (PORs)
for EUV mask cleaning that are effective in removing the contamination of interest
yet are gentle enough to be applied repeatedly without reducing mask lifetime.
Additional investigation and optimization of EUV reticle back-side cleaning
processes which do not influence the front-side will, as part of the overall
mask cleaning program, assist to keep the overlay performance of the EUV scanner
in spec
Kurt Ronse, program director advanced lithography at IMEC said, “Over
the last year, we achieved major progress on resist for EUV but pristine, defect-free
masks at point-of-exposure have become an increasing concern in advancing EUV
towards pilot production in 2010. Therefore, we will extend our program with
mask cleaning research to offer our partners advanced research on one of the
critical EUV mask related issues in EUV lithography. The installation of the
MaskTrack Pro and our on-going collaborative research efforts with the HamaTech
team ensures that a complete mask integrity infrastructure is available for
interested partners at IMEC's 300mm research facility before end 2009.”
MaskTrack Pro combines the performance of the MaskTrack tool with innovative
cleaning technology and a sophisticated system design for a holistic approach
of mask integrity, focused on 193i 22nm half pitch double patterning, EUV and
Nano-Imprint lithography technologies. The system features Focused Spot CleaningTM
for precise removal of particles in defined areas of the mask, saving significant
time after repair and eliminating the toughest overlay issues caused by backside
contamination. A unique combination of physical and chemical cleaning technologies
have demonstrated a highly-effective removal of organic and inorganic contamination
without damage to the vulnerable absorber and capping layer (SPIE, March 2009).
MaskTrack Pro's holistic approach to mask integrity ensures that the reticle
is defect-free at exposure, offering customers a dramatic increase in exposure
tool availability and uptime.
“We are very pleased to collaborate with IMEC on critical mask cleaning
technology for next generation lithography processes,” said Wilma Koolen-Hermkens,
CEO of HamaTech APE. “The MaskTrack Pro, is the first system in the industry
that can address EUVL zero tolerance levels for particles and defects on the
mask prior to exposure. With a world class design, the MaskTrack Pro allows
clustering of metrology systems and pod-in-pod stocking for a holistic mask
management approach throughout the life of the mask. IMEC is our partner of
choice to jointly develop the necessary PORs for our valued customers.”